Comparison of the Advanced Oxidation Processes (UV, UV/H 2O 2 and O 3) for the Removal of Antibiotic Substances during Wastewater Treatment

Ozone: Science and Engineering

Volumn 34, Issue 2, 2012, Pages 136-139

  Biń, Andrzej K ^a   Sobera Madej, Sylwia ^b  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b INSTITUTE OF INDUSTRIAL ORGANIC CHEMISTRY   (Poland)

Author keywords

Advanced oxidation processes; Ozone; Pharmaceuticals; Photodegradation; UV light; Wastewater

Indexed keywords

ADVANCED OXIDATION PROCESSES; ANTIBIOTIC WASTEWATERS; DIRECT PHOTOLYSIS; UV- AND;

DRUG PRODUCTS; OXIDATION RESISTANCE; OZONE; OZONE WATER TREATMENT; OZONIZATION; PHOTODEGRADATION; PHOTOLYSIS; ULTRAVIOLET RADIATION; WASTEWATER;

ANTIBIOTICS;

EID: 84859624470     PISSN: 01919512     EISSN: 15476545     Source Type: Journal    
DOI: 10.1080/01919512.2012.650130     Document Type: Article

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