Electrochemical behaviour of amorphous electrodeposited chromium coatings

Materials Chemistry and Physics

Volumn 133, Issue 2-3, 2012, Pages 1092-1100

  Sziráki, Laura ^a   Kuzmann, Erno ^a   Papp, Katalin ^b   Chisholm, Colin U ^c   El Sharif, Mahmoud R ^c   Havancsák, Karoly ^a  

^a EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^b CHEMICAL RESEARCH CENTER   (Hungary)

^c GLASGOW CALEDONIAN UNIVERSITY   (United Kingdom)

Author keywords

Amorphous chromium coating; Corrosion; Electrochemical impedance spectroscopy (EIS); Electrochemical properties; Electron microscopy (SEM); Electroplating; Energy dispersive analysis of X ray (EDS); X ray diffraction

Indexed keywords

BATH TEMPERATURES; CHROMIUM COATINGS; COPPER SUBSTRATES; CORROSION BEHAVIOUR; CORROSION KINETICS; CORROSION POTENTIALS; CORROSION PROCESS; CORROSIVE ATTACKS; DEPOSITION PARAMETERS; ELECTROCHEMICAL BEHAVIOUR; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EIS); ELECTROCHEMICAL PASSIVATION; ELECTRODEPOSITION CELLS; ENERGY DISPERSIVE ANALYSIS OF X-RAYS; EQUIVALENT CIRCUIT MODEL; HIGH CURRENTS; HIGH SPEED FLOWS; IMMERSION TIME; IMPEDANCE SPECTRUM; NONLINEAR LEAST SQUARES; POTENTIAL STEPS; POTENTIODYNAMICS; QUASI-STATIONARY; TRIVALENT CHROMIUM; XRD;

AMINO ACIDS; CHROMATE COATINGS; CHROMIUM; COPPER; CORROSION; DEPOSITS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMICAL PROPERTIES; ELECTRODEPOSITION; ELECTRON MICROSCOPY; ELECTROPLATING; FLOW RATE; METAL COATINGS; PASSIVATION; SUBSTRATES; SULFURIC ACID; X RAY DIFFRACTION;

ELECTROCHEMICAL CORROSION;

EID: 84859427032     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.02.021     Document Type: Article

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