Role of surface stoichiometry on the interfacial electron behavior at Ni/TiO 2(0 0 1) interfaces

Materials Chemistry and Physics

Volumn 133, Issue 2-3, 2012, Pages 871-875

  Tao, Junguang ^a,b   Pan, J S ^c   Chiam, S Y ^c   Huan, C H A ^b  

^a UNIVERSITY OF SOUTH FLORIDA   (United States)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

C. Photoelectron spectroscopy; Ni; Surface chemistry; TiO 2

Indexed keywords

CLUSTER SIZE EFFECTS; ELECTRON BEHAVIOR; IMAGE-CHARGE EFFECTS; INSULATOR-TO-METAL TRANSITIONS; INTERFACIAL CHARGE TRANSFER; INTERFACIAL DIPOLES; INTERFACIAL PROPERTY; NI CLUSTERS; OVERLAYERS; RUTILE TIO; STOICHIOMETRIC SURFACES; SURFACE STOICHIOMETRY; TIO; X RAY PHOTOELECTRON SPECTROSCOPIES (XPS);

BINDING ENERGY; CHARGE TRANSFER; INTERFACES (MATERIALS); NICKEL; OXIDE MINERALS; STOICHIOMETRY; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84859424336     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.01.109     Document Type: Article

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