Structural, optical and electrical characteristics of a new NLO crystal

Optics and Laser Technology

Volumn 44, Issue 6, 2012, Pages 1689-1697

  Dsilva, E D ^a   Krishna Podagatlapalli, G ^b   Venugopal Rao, S ^b   Dharmaprakash, S M ^a  

^a MANGALORE UNIVERSITY   (India)

^b UNIVERSITY OF HYDERABAD   (India)

Author keywords

Laser damage threshold; Nonlinear optical material; Third harmonic generation

Indexed keywords

BREWSTER ANGLE; ELECTRICAL CHARACTERISTIC; ELECTRICAL MEASUREMENT; FT-IR SPECTRUM; GROWN CRYSTALS; LASER DAMAGE THRESHOLD; MONOCLINIC SYSTEMS; ND : YAG LASERS; NLO CRYSTALS; NON-CENTROSYMMETRIC; NON-LINEAR OPTICAL MATERIAL; NON-LINEAR PARAMETERS; NONLINEAR OPTICAL; ORGANIC CRYSTAL; REFERENCE MATERIAL; SINGLE CRYSTAL X-RAY DIFFRACTION; SLOW EVAPORATION; SPACE GROUPS; THERMALLY STABLE; THIRD ORDER; THIRD-HARMONIC GENERATION; WAVELENGTH RANGES; Z-SCAN TECHNIQUE;

FUNCTIONAL GROUPS; HARMONIC GENERATION; LASER DAMAGE; NONLINEAR OPTICS; SINGLE CRYSTALS; UREA; X RAY DIFFRACTION;

REFRACTIVE INDEX;

EID: 84859159392     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2012.01.017     Document Type: Article

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