Estimating Kapitza resistance between Si-SiO 2 interface using molecular dynamics simulations

IEEE Transactions on Components, Packaging and Manufacturing Technology

Volumn 1, Issue 8, 2011, Pages 1132-1139

  Mahajan, Sanket S ^a   Subbarayan, Ganesh ^a   Sammakia, Bahgat G ^b  

^a PURDUE UNIVERSITY   (United States)

^b BINGHAMTON UNIVERSITY   (United States)

Author keywords

Kapitza resistance; reverse non equilibrium molecular dynamics simulations; Si SiO 2 interface

Indexed keywords

ACOUSTIC MISMATCH MODELS; CRITICAL APPLICATIONS; DIFFUSE MISMATCH MODELS; KAPITZA RESISTANCE; MOLECULAR DYNAMICS SIMULATIONS; NANOSCALE FILMS; NON EQUILIBRIUM MOLECULAR DYNAMIC (NEMD); SEMICONDUCTOR INDUSTRY; SILICON-ON-INSULATOR DEVICES; TECHNOLOGICAL ADVANCES; THERMAL TRANSPORT; THICK OXIDES;

HEAT FLUX; MOLECULAR DYNAMICS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; SILICON COMPOUNDS;

SILICON OXIDES;

EID: 84859078649     PISSN: 21563950     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCPMT.2011.2112356     Document Type: Article

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