Effect of voltage waveform on dielectric barrier discharge ozone production efficiency

EPJ Applied Physics

Volumn 57, Issue 3, 2012, Pages

  Mericam Bourdet, N ^a,b   Kirkpatrick, M J ^b   Tuvache, F ^a   Frochot, D ^a   Odic, E ^b  

^a EDF R AND D   (France)

^b AUTOMATIC CONTROL DEPARTMENT   (France)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; BI-DIRECTIONAL; CURRENT PEAK; CURRENT VOLTAGE; DIELECTRIC BARRIER DISCHARGES; DISCHARGE GAPS; DRY AIR; ENERGY EFFICIENCY IMPROVEMENTS; GAS EFFLUENTS; INPUT POWER; NANOSECOND RANGE; OZONE GENERATION; OZONE PRODUCTION; POWER SUPPLY; PULSED POWER SUPPLY; REACTOR GEOMETRIES; VOLTAGE RISE; VOLTAGE WAVEFORMS;

CYLINDERS (SHAPES); EFFLUENTS; ELECTRIC REACTORS; ENERGY EFFICIENCY; OZONE; PLASMA APPLICATIONS;

DIELECTRIC DEVICES;

EID: 84859057744     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2012110302     Document Type: Article

References (35)

1. R. McAdams, J. Phys. D: Appl. Phys. 34, 2810 (2001)
2. S. Pasquiers, Eur. Phys. J. Appl. Phys. 28, 319 (2004)
3. R. Rudolph, K.-P. Francke, H. Miessner, Plasma Chem. Plasma Process. 22, 401 (2002)
4. U. Kogelschatz, Pure Appl. Chem. 62, 1667 (1990)
5. Sz. Beleznai, G. Mihajlik, I. Maros, L. Balazs, P. Richter, J. Phys. D: Appl. Phys. 41, 115202 (2008)
6. H.-E. Wagner, R. Brandenburg, K.V. Kozlov, A. Sonnenfeld, P. Michel, J.F. Behnke, Vacuum 71, 417 (2003)
7. F. Massines, G. Gouda, J. Phys. D: Appl. Phys. 31, 3411 (1998)
8. K. Teranishi, N. Shinomura, S. Suzuki, H. Itoh, Plasma Sources Sci. Technol. 18, 045011 (2009)
9. G.J. Pietsch, V.I. Gibalov, Pure Appl. Chem. 70, 1169 (1998)
10. H.L. Chen, H.M. Lee, S.H. Chen, T.C. Wei, M.B. Chang, Plasma Sources Sci. Technol. 19, 055009 (2010)
11. L. Hulka, G.J. Pietsch, Plasma Processes Polym. 2, 222 (2005)
12. M.A. Jani, K. Toda, K. Takaki, T. Fujiwara, J. Phys. D: Appl. Phys. 33, 3078 (2000)
13. K. Takaki, Y. Hatanaka, K. Arima, S. Mukaigawa, T. Fujiwara, Vacuum 83, 128 (2009)
14. N. Osawa, H. Kaga, Y. Fukuda, S. Harada, Y. Yoshioka, R. Hanaoka, Eur. Phys. J. Appl. Phys. 55, 13802 (2011)
15. S. Masuda, M. Sato, T. Seki, IEEE Trans. Ind. Appl. 22, 886 (1986)
16. D. Wang, T. Matsumoto, T. Namihira, H. Akiyama, J. Adv. Oxid. Technol. 13, 71 (2010)
17. S. Liu, M. Neiger, J. Phys. D: Appl. Phys. 34, 1632 (2001)
18. J. Salge, P. Braumann, in Proc. of 4th Int. Symp. on Plasma Chemistry, Zurich, 1979, pp. 735-741
19. J.M. Williamson, D.D. Trump, P. Bletzinger, B.N. Ganguly, J. Phys. D: Appl. Phys. 39, 4400 (2006)
20. K. Okazaki, T. Nozaki, Pure Appl. Chem. 74, 447 (2002)
21. H. Wong, D. Li, Y. Wu, J. Li, G. Li, J. Electrostat. 67, 547 (2009)
22. S.L. Yao, E. Suzuki, N. Meng, A. Nakayama, Energy Fuels 15, 1300 (2001)
23. R. Korzekwa, L. Rosocha, Z. Falkenstein, in Proc. of 11th IEEE International Pulsed Power Conference, Baltimore, MD, 1997, p. 7
24. E. Odic, M. Dhainault, M. Petit, A. Goldman, M. Goldman, C. Karimi, J. Adv. Oxid. Technol. 6, 41 (2003)
25. A. Mfopara, M.J. Kirkpatrick, E. Odic, Plasma Chem. Plasma Process. 29, 91 (2009)
26. L. Parissi, E. Odic, A. Goldman, M. Goldman, J.-P. Borra, Chapter 11: Temperature effects on plasma chemical reactions. Application to VOC removal from flue gases by dielectric barrier discharges, in Electrical Discharges for Environmental Purposes: Fundamentals and Applications, edited by E.M. Van Veldhuizen (Nova Science Publishers, New York, 2000), p. 279
27. I. Stefanovic, N.K. Bibinov, A.A. Deryugin, I.P. Vinogradov, A.P. Napartovich, K. Wiesemann, Plasma Sources Sci. Technol. 10, 406 (2001)
28. S. Hadj-Ziane, B. Held, P. Pignolet, R. Peyrous, C. Coste, J. Phys. D: Appl. Phys. 25, 677 (1992)
29. R. Atkinson, D.L. Baulch, R.A. Cox, R.F. Hampson, J.A. Kerr, J. Troe, J. Phys. Chem. Ref. Data 18, 881 (1989)
30. I.M. Campbell, C.N. Gray, Chem. Phys. Lett. 18, 607 (1973)
31. R. Atkinson, D.L. Baulch, R.A. Cox, R.F. Hampson, J.A. Kerr, M.J. Rossi, J. Troe, J. Phys. Chem. Ref. Data 26, 521 (1997)
32. R. Atkinson, D.L. Baulch, R.A. Cox, J.N. Crowley, R.F. Hampson, R.G. Hynes, M.E. Jenkin, M.J. Rossi, J. Troe, Atmos. Chem. Phys. 4, 1461 (2004)
33. G.J.M. Hagelaar, L.C. Pitchford, Plasma Sources Sci. Technol. 14, 722 (2005)
34. P.A. Vitello, B.M. Penetrante, J.N. Bardsley, in Non-Thermal Plasma Techniques for Pollution Control-Part A: Overview, Fundamentals and Supporting Technologies, edited by B.M. Penetrante, S.E. Schultheis (Springer-Verlag, Berlin, 1993), p. 249-271
35. B.M. Penetrante, M.C. Hsiao, B.T. Merritt, G.E. Vogtlin, P.H. Wallman, IEEE Trans. Plasma Sci. 23, 679 (1995)