|
Volumn 507, Issue , 2012, Pages 53-57
|
Fundamentals of pulsed and direct current electrophoretic infiltration kinetics
|
Author keywords
Electrophoretic deposition; Infiltration; Porous substrates; Pulsed EPD; Silicon dioxide
|
Indexed keywords
BORON CARBIDE;
CERAMIC MATERIALS;
COATINGS;
DEPOSITION;
ELECTROHYDRODYNAMICS;
ELECTROMAGNETIC FIELDS;
ELECTROPHORESIS;
INFILTRATION;
POROUS MATERIALS;
POROUS SILICON;
SCANNING ELECTRON MICROSCOPY;
SILICA;
SUBSTRATES;
SURFACE CHEMISTRY;
ADVANCED COMPOSITES;
CERAMIC NANOPARTICLES;
ELECTROPHORETIC DEPOSITIONS;
INFILTRATION KINETICS;
NON-DIMENSIONAL PARAMETERS;
POROUS SUBSTRATES;
PULSED EPD;
TOKAMAK FUSION REACTORS;
HVDC POWER TRANSMISSION;
|
EID: 84859017137
PISSN: 10139826
EISSN: 16629795
Source Type: Book Series
DOI: 10.4028/www.scientific.net/KEM.507.53 Document Type: Conference Paper |
Times cited : (1)
|
References (12)
|