Ferromagnetism in hydrogenated N-doped amorphous carbon films

Journal of Applied Physics

Volumn 111, Issue 5, 2012, Pages

  Liu, S Y ^a,b   Zhen, C M ^a   Li, Y Z ^a   Pan, C F ^a   Zhou, H J ^a   Hou, D L ^a  

^a HEBEI NORMAL UNIVERSITY   (China)

^b SHAOXING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; FERROMAGNETIC IMPURITIES; N-DOPED; ORBITALS; ROOM TEMPERATURE FERROMAGNETISM;

AMORPHOUS CARBON; ANNEALING; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; FERROMAGNETISM; HYDROGENATION; MAGNETIC MOMENTS; MAGNETIZATION; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

METAL ANALYSIS;

EID: 84858952902     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3692084     Document Type: Article

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