Controlled particle self-assembly in an evaporating droplet

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 398, Issue , 2012, Pages 64-68

  Shao, Fen Fen ^a   Neild, Adrian ^a   Alan, Tuncay ^a  

^a MONASH UNIVERSITY   (Australia)

Author keywords

Coffee stain; Evaporation; Self assembly

Indexed keywords

DROPS; EVAPORATION; PHASE TRANSITIONS; SELF ASSEMBLY;

ADDITIONAL CONTROL; BIOSENSING; GEOMETRICAL FEATURES; LOW COSTS; NATURAL PROCESS; PARTICULATE MATTER; WETTING CONDITIONS;

PARTICLES (PARTICULATE MATTER);

ARTICLE; BIOENGINEERING; CHEMICAL REACTION; EVAPORATING DROPLET; EVAPORATION; FLAGELLUM; GEOMETRY; PARTICLE SIZE; PARTICULATE MATTER; PRIORITY JOURNAL;

EID: 84858624061     PISSN: 09277757     EISSN: 18734359     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2012.02.010     Document Type: Article

References (30)

1. Dufresne E.R., Grier D.G. Rev. Sci. Instrum. 1998, 69:1974.
2. Baumgartl J., Hannappel G.M., Stevenson D.J., Day D., Gu M., Dholakia K. Lab Chip 2009, 9:1334.
3. Manneburg O., Vanherberghen B., Svennebring J., Hertz H.M., Onfelt B., Wiklund M. Appl. Phys. Lett. 2008, 93:063901.
4. Neild A., Oberti S., Radziwill G., Dual J. Biotechnol. Bioeng. 2007, 97:1335.
5. Manaresi N., Romani A., Medero G., Altomare L., Leonardi A., Tartagini M., Guerrieni R. IEEE J. Solid-state Circuits 2003, 38:2297.
6. Lee H., Purdon A.M., Westervelt R.M. Appl. Phys. Lett. 2004, 85:1063.
7. Whitehill J., Neild A., Ng T.W., Stokes M. Appl. Phys. Lett. 2010, 96:053501.
8. Deegan R.D., Bakajin O., Dupont T.F., Nagel S.R., Witten T.A. Nature 1997, 389:827.
9. Rieger B., van del Doel L.R., van Vliet L.J. Phys. Rev. E 2003, 68:036312.
10. Chen Z., Liu M., Liu G., Tan L. Appl. Phys. Lett. 2009, 95:223104.
11. Deegan R.D. Phys. Rev. E 2000, 61:1.
12. Deegan R.D., Bakajin O., Dupont T.F., Nagel S.R., Witten T.A. Phys. Rev. E 2000, 62:756.
13. Kaneda M., Hyakuta K., Takao Y., Ishizuka H., Fukai J. Langmuir 2008, 24:9102.
14. Shao F.F., Neild A., Ng T.W. J. Appl. Phys. 2010, 108:034512.
15. de Gans B.-J., Shubert U.S. Langmuir 2004, 20:7789.
16. Kajiya T., Nishitani E., Yamaue T., Doi M. Phys. Rev. E 2006, 73:011601.
17. V. Jokinen, S. Franssila, M. Baumann, Microfluid. Nanofluid., doi:10.1007/s10404-011-0781-x.
18. Denkov N.D., Velev O.D., Kralchevsky P.A., Ivanov I.B. Nature 1993, 361:26.
19. Malaquin L., Kraus T., Schmid H., Delamarche E., Wolf H. Langmuir 2007, 23:11513.
20. Lin X., Neild A., Ng T.W., Shao F. Appl. Phys. Lett. 2009, 94:034104.
21. Perez J.W., Haselton F.R., Wright D.W. Analyst 2009, 134:1548.
22. Shmuylovich L., Shen A.Q., Stone H.A. Langmuir 2002, 18:3441.
23. Iliev S.D. J. Colloid Interface Sci. 1999, 213:1.
24. Panduputra Y., Ng T.W., Neild A., Robinson M. Appl. Opt. 2010, 49:3669.
25. Neild A., Padding J.T., Yu L., Bhaduri B., Briels W.J., Ng T.W. Phys. Rev. E 2010, 82:041126.
26. Padding J.T., Briels W.J. J. Chem. Phys. 2010, 132:054511.
27. Abbott J.J., Peyer K.E., Cosentino Lagomarsino M., Zhang L., Dong L.X., Kaliakatsos I.K., Nelson B.J. Int. J. Robot. Res. 2009, 28:1434.
28. Watson B., Friend J., Yeo L. J. Micromach. Microeng. 2009, 19:022001.
29. Purcell E.M. Am. J. Phys. 1977, 45:3.
30. Keaveny E.E., Maxey M.R. J. Fluid Mech. 2008, 598:293.