-
1
-
-
0000511869
-
Selective niobium anodization process for fabricating Josephson tunnel junctions
-
August
-
H. Kroger, L.N. Smith, and D.W. Jillie “Selective niobium anodization process for fabricating Josephson tunnel junctions, “Appl.Phys.Lett., Vol. 39, pp. 280–282, August 1981.
-
(1981)
Appl.Phys.Lett.
, vol.39
, pp. 280-282
-
-
Kroger, H.1
Smith, L.N.2
Jillie, D.W.3
-
2
-
-
36749108668
-
High quality refractory Josephson tunnel junctions utilizing thin alminum layers
-
M. Gurvitch, M.A. Washington, and H.A. Huggins, “High quality refractory Josephson tunnel junctions utilizing thin alminum layers,” Appl. Phys.Lett., Vol. 42, pp. 472–474, March 1983.
-
(1983)
Appl. Phys.Lett.
, vol.42
, pp. 472-474
-
-
Gurvitch, M.1
Washington, M.A.2
Huggins, H.A.3
-
3
-
-
0019070031
-
Niobium oxide-barrier tunnel junctions
-
October
-
R.F. Broom, S.I. Raider, A. Oosenbrug, R.E. Drake, and W. Walter, “Niobium oxide-barrier tunnel junctions,” IEEE Trans. Electron Devices, Vol. ED-27, pp. 1998–2008, October 1980.
-
(1980)
IEEE Trans. Electron Devices
, vol.ED-27
, pp. 1998-2008
-
-
Broom, R.F.1
Raider, S.I.2
Oosenbrug, A.3
Drake, R.E.4
Walter, W.5
-
4
-
-
0020127853
-
All refractory Josephson tunnel junctions fabricated by reactive ion etching
-
May
-
A. Shoji, S. Kosaka, F. Shinoki, M. Aoyagi, and H. Hayakawa, “All refractory Josephson tunnel junctions fabricated by reactive ion etching,” IEEE Trans. Magn., Vol. MAG-19 pp. 827–830, May 1983.
-
(1983)
IEEE Trans. Magn.
, vol.MAG-19
, pp. 827-830
-
-
Shoji, A.1
Kosaka, S.2
Shinoki, F.3
Aoyagi, M.4
Hayakawa, H.5
-
5
-
-
0020737347
-
All-refractory refractory Josephson logic circuits
-
D. Jillie, L.N. Smith, H. Kroger, L.W. Currier, R.L. Payer, C. Potter, and D.M. Shaw, “All-refractory refractory Josephson logic circuits,” IEEE J. Solid-State Circuits, Vol. SC-18, pp. 173–180, April 1983.
-
(1983)
IEEE J. Solid-State Circuits
, vol.SC-18
, pp. 173-180
-
-
Jillie, D.1
Smith, L.N.2
Kroger, H.3
Currier, L.W.4
Payer, R.L.5
Potter, C.6
Shaw, D.M.7
-
6
-
-
36749115382
-
High speed logic operations of all refractory Josephson integrated circuits
-
S. Kosaka, A. Shoji, M. Aoyagi, F. Shinoki, H. Nakagawa, S. Takada, and H. Hayakawa, “High speed logic operations of all refractory Josephson integrated circuits,” Appl.Phys.Lett., Vol. 43, pp. 213–215, July 1983.
-
(1983)
Appl.Phys.Lett.
, vol.43
, pp. 213-215
-
-
Kosaka, S.1
Shoji, A.2
Aoyagi, M.3
Shinoki, F.4
Nakagawa, H.5
Takada, S.6
Hayakawa, H.7
-
7
-
-
0018912398
-
Reactive ion etching in the fabrication of niobium tunnel junctions
-
January
-
S.A. Reible, “Reactive ion etching in the fabrication of niobium tunnel junctions,” IEEE Trans. Magn., Vol. MAG-17 pp. 303–306, January 1981.
-
(1981)
IEEE Trans. Magn.
, vol.MAG-17
, pp. 303-306
-
-
Reible, S.A.1
-
8
-
-
0019632863
-
Reactive ion etching of niobium
-
T.T. Foxe, B.D. Hunt, C. Rogers, A.W. Kleinsasser, and R.A. Buhrman, “Reactive ion etching of niobium,” J.Vac.Sci.Technol., Vol. 19, pp. 1394–1397, 1397, November 1981.
-
(1981)
J. Vac.Sci. Technol.
, vol.19
, pp. 1394-1397
-
-
Foxe, T.T.1
Hunt, B.D.2
Rogers, C.3
Kleinsasser, A.W.4
Buhrman, R.A.5
-
9
-
-
0020994609
-
Josephson cell array circuit using four junction logic (4jL) gates
-
Tokyo
-
H. Nakagawa, H. Ohigashi, I. Kurosawa, E. Sogawa, S. Takada, and H. Hayakawa, “Josephson cell array circuit using four junction logic (4jL) gates,” Extended Abstract 15th Conf. Solid State Devices and Materials, Tokyo, pp. 137–140, 1983.
-
(1983)
Extended Abstract 15th Conf. Solid State Devices and Materials
, pp. 137-140
-
-
Nakagawa, H.1
Ohigashi, H.2
Kurosawa, I.3
Sogawa, E.4
Takada, S.5
Hayakawa, H.6
-
10
-
-
0020553524
-
-
Japanese Supplment 22–1
-
K. Suyama, H. Shimizu, S. Yokogawa, Y. Nakayama, and A. Shibatomi, Japanese J.Appl.Phys., Vol. Supplment 22–1, pp. 341–344, 1983.
-
(1983)
J.Appl.Phys.
, pp. 341-344
-
-
Suyama, K.1
Shimizu, H.2
Yokogawa, S.3
Nakayama, Y.4
Shibatomi, A.5
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