Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering

Journal of Synchrotron Radiation

Volumn 19, Issue 2, 2012, Pages 216-222

  Krause, Bärbel ^a   Darma, Susan ^a   Kaufholz, Marthe ^a   Gräfe, Hans Hellmuth ^a   Ulrich, Sven ^a   Mantilla, Miguel ^b   Weigel, Ralf ^b   Rembold, Steffen ^c   Baumbach, Tilo ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c CreaTec Fischer Co GmbH   (Germany)

Author keywords

deposition chamber; in situ X ray measurement; polycrystalline materials; sputter deposition; texture; thin film growth

Indexed keywords

DC MAGNETRON SPUTTERING; DEPOSITION ANGLE; DEPOSITION CHAMBERS; IN-SITU; IN-SITU DIFFRACTION; MODULAR DESIGNS; POLYCRYSTALLINE; REFLECTIVITY MEASUREMENTS; RF-MAGNETRON SPUTTERING; SPUTTERING SYSTEMS; SURFACE ANALYSIS METHODS; VACUUM CHAMBERS; VANADIUM CARBIDES;

CARBIDES; EXPERIMENTS; FILM GROWTH; MAGNETRON SPUTTERING; PLASMA DIAGNOSTICS; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SURFACE ANALYSIS; TEXTURES; THIN FILMS; VANADIUM;

X RAYS;

EID: 84857519759     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049511052320     Document Type: Article

References (27)

1. Anders, A.2010). Thin Solid Films, 518, 4087-4090.
2. Bøttiger, J., Chevallier, J., Petersen, J. H., Schell, N., Matz, W.& Mü cklich, A.2002). J. Appl. Phys. 91, 5429-5433.
3. Braun, C. (1997-1999). Copyright Christian Braun, HMI Berlin, Germany.
4. Ellmer, K.,Mientus, R.,Weiß, V.& Rossner, H. (2001). Nucl. Instrum. Methods Phys. Res. A, 467/468, 1041-1044.
5. Fuoss, P. H., Kisker, D. W., Stephenson, G. B.& Brennan, S. (1995). Mater. Sci. Eng. B, 30, 99-108.
6. Han, J.G.2009). J. Phys. D, 42, 043001.
7. Jenichen, B., Braun, W., Kaganer, V. M., Shtukenberg, A. G., Dä weritz, L., Schulz, C.-G.& Ploog, K.H.2003). Rev. Sci. Instrum. 74, 1267-1273.
8. Kaganer, V., Braun, W.& Ploog, B. J. K.H.2004). Surf. Sci. 560, 88-102.
9. Kersten, H., Deutsch, H., Steffen, H., Kroesen, G. M. W.& Hippler, R. (2001). Vacuum, 63, 385-413.
10. Liang, Y.-C., Lee, H.-Y., Liu, H.-J., Hsieh, Y.-W.& Liang, Y.-C. (2007). J. Synchrotron Rad. 14, 163-168.
11. Lü tzenkirchen-Hecht, D., Bruder, K., abd, P., Keil, U. H.,Markert, C., Ringpfeil, C.& Frahm, R. (2005). Rev. Sci. Instrum. 76, 073905.
12. Mahieu, S., Ghekiere, P., Depla, D.& Gryse, R.D.2006). Thin Solid Films, 515, 1229-1249.
13. Matz,W., Schell, N., Neumann,W., Bøttiger, J.& Chevallier, J.2001). Rev. Sci. Instrum. 72, 3344-3348.
14. Nowotny, H. N.& Kieffer, R. (1947). Metallforschung, 2, 257-265.
15. Payne, A. P., Clemens, B. M.& Brennan, S. (1993). J. Vac. Sci. Technol. A, 12, 598-600.
16. Peverini, L., Ziegler, E., Bigault, T.& Kozhevnikov, I. (2005). Phys. Rev. B 72, 045445.
17. Renaud, G., Ducruet, M., Ulrich, O.& Lazzari, R. (2004). Nucl. Instrum. Methods Phys. Res. B, 222, 667-680.
18. Ringpfeil, C., Lü tzenkirchen-Hecht, D.& Frahm, R. (2007). Thin Solid Films, 515, 5597-5600.
19. Schell, N.,Martins, R.M.& Fernandes, F.M.B.2005). Appl. Phys. A, 81, 1441-1445.
20. Schell, N., von Borany, J.& Hauser, J.2007). AIP Conf. Proc. 879, 1813-1816.
21. Telling, N. D., van der Lann, G., Georgieva, M. T.& Farley, N. R.S.2006). Rev. Sci. Instrum. 77, 073903.
22. Thornton, J. A.1974). J. Vac. Sci. Technol. 11, 666-670.
23. Vlieg, E., van der Gon, A. W., van der Veen, J. F., Macdonald, J. E.& Norris, C. (1988). Phys. Rev. Lett. 61, 2241-2244.
24. Vonk, V., Konings, S., Barthe, L., Gorges, B.& Graafsma, H. (2005). J. Synchrotron Rad. 12, 833-834.
25. Williams, S. M., Yang, H. Q.& Ketterson, J.B.1991). Rev. Sci. Instrum. 63, 1147-1149.
26. Willmott, P. R., Schlepü tz, C. M., Patterson, B. D., Herger, R., Lange, M., Meister, D., Maden, D., Brö nnimann, C., Eikenberry, E. F., Hü lsen, G.& Al-Adwan, A.2005). Appl. Surf. Sci. 247, 188-196.
27. Zheng, J. Q., Shih, M. C., Wang, X. K., Williams, S., Dutta, P., Chang, R. P. H.& Ketterson, J.B.1991). J. Vac. Sci. Technol. A, 9, 128-132.