Laser annealing to form high-temperature phase of FeS 2

Japanese Journal of Applied Physics

Volumn 51, Issue 2 PART 2, 2012, Pages

  Umehara, Mitsutaro ^a   Takeda, Yasuhiko ^a   Azuma, Hirozumi ^a   Motohiro, Tomoyoshi ^a  

^a Rd Management Section   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FES FILMS; HIGH TEMPERATURE; HIGH TEMPERATURE PHASE; INDUCED PHASE CHANGE; LASER ANNEALING; LOW TEMPERATURE PHASE; PHASE FORMATIONS; PYRITE THIN FILMS; RAPID COOLING; SAMPLE TEMPERATURE; SULFUR VAPORS; TEMPORAL EVOLUTION;

LASER HEATING; SULFIDE MINERALS; SULFUR; X RAY DIFFRACTION;

ANNEALING;

EID: 84857497807     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.02BP10     Document Type: Article

References (23)

1. T. Suzuki: J. Appl. Phys. 99 (2006) 111101.
2. M. Wutting and N. Yamada: Nat. Mater. 6 (2007) 824.
3. C. Wadia, A. P. Alivisatos, and D. M. Kammen: Environ. Sci. Technol. 43 (2009) 2072.
4. B. L. Abrams and J. P. Wilcoxon: Crit. Rev. Solid State Mater. Sci. 30 (2005) 153.
5. H. Okamoto: Phase Diagrams for Binary Alloys (ASM International, Materials Park, OH, 2010) 2nd ed., p. 388.
6. G. Willeke, R. Dasbach, B. Sailer, and E. Bucher: Thin Solid Films 213 (1992) 271.
7. S. Nakamura and A. Yamamoto: Sol. Energy Mater. Sol. Cells 65 (2001) 79.
8. D. Lichtenberger, K. Ellmer, R. Schieck, S. Fiechter, and H. Tributsch: Thin Solid Films 246 (1994) 6.
9. B. Thomas, C. Hopfner, K. Ellmer, S. Fiechter, and H. Tributsch: J. Cryst. Growth 146 (1995) 630.
10. B. Ouertani, J. Ouerfelli, M. Saadoun, B. Bessais, M. Hajji, M. Kanzari, H. Ezzaouia, N. Hamdadou, and J. C. Bernede: Mater. Lett. 59 (2005) 734.
11. R. H. Misho and W. A. Murad: Sol. Energy Mater. Sol. Cells 27 (1992) 335.
12. C. de las Heras and G. Lifante: J. Appl. Phys. 82 (1997) 5132.
13. Y. H. Liu, L. Meng, and L. Zhang: Thin Solid Films 479 (2005) 83.
14. D. Wan, Y. Wang, B. Wang, C. Ma, H. Sun, and L. Wei: J. Cryst. Growth 253 (2003) 230.
15. L. Meng and M. S. Liu: Mater. Sci. Eng. B 60 (1999) 168.
16. H. Katagiri, K. Jimbo, W.-S. Maw, K. Oishi, M. Yamazaki, H. Araki, and A. Takeuchi: Thin Solid Films 517 (2009) 2455.
17. H. Vogt, T. Chattopadhyay, and H. J. Stolz: J. Phys. Chem. Solids 44 (1983) 869.
18. H. D. Lutz and B. Müller: Phys. Chem. Miner. 18 (1991) 265.
19. S. Ogawa: J. Phys. Soc. Jpn. 41 (1976) 462.
20. W. D. Johnston, R. C. Mille, and D. H. Damon: J. Less-Common Met. 8 (1965) 272.
21. Corning® EAGLE™ XG AMLCD Glass Substrates Material Information [http://www.coresix.com/images/EAGLE-XG-material-information.pdf ].
22. Y. S. Touloukian, P. E. Liley, and S. C. Saxena: Thermal Conductivity: Nonmetallic Liquids and Gases (IFI/Plenum, New York, 1970) p. 512.
23. Y. S. Touloukian, P. W. Powell, C. Y. Ho, and M. C. Nicolaou: Thermal Diffusivity (IFI/Plenum, New York, 1973) p. 518.