Photoinitiated nitric oxide-releasing tertiary S-nitrosothiol-modified xerogels

ACS Applied Materials and Interfaces

Volumn 4, Issue 2, 2012, Pages 796-804

  Riccio, Daniel A ^a   Coneski, Peter N ^a   Nichols, Scott P ^a   Broadnax, Angela D ^a   Schoenfisch, Mark H ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

antimicrobial; nitric oxide; photolysis; S nitrosothiol; sol gel

Indexed keywords

ANTIMICROBIAL; COATING THICKNESS; CONTROL INTERFACES; NITROSO; PHYSIOLOGICAL BUFFERS; PHYSIOLOGICAL TEMPERATURE; PSEUDOMONAS AERUGINOSA; S-NITROSOTHIOL; SILANE PRECURSOR; SOLVENT CONCENTRATION; STERIC HINDRANCES; STORAGE STABILITY; SYNTHETIC PARAMETERS; XEROGEL FILMS;

ADHESION; BACTERIA; COATINGS; NITRIC OXIDE; PHOTOLYSIS; PHYSIOLOGY; SOL-GELS; THICKNESS MEASUREMENT;

XEROGELS;

EID: 84857393101     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am201443r     Document Type: Article

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