Ion beam sputter-deposition of LiCoO 2 films

Thin Solid Films

Volumn 520, Issue 9, 2012, Pages 3668-3674

  Stockhoff, Tobias ^a   Gallasch, Tobias ^a   Berkemeier, Frank ^a   Schmitz, Guido ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Electrical conductivity; Electron energy loss spectroscopy; Intercalation compounds; Lithium cobalt oxide; Sputtering; Thin film electrodes

Indexed keywords

ARGON ATMOSPHERES; ELECTRICAL CONDUCTIVITY; ELECTRON ENERGY LOSS; LATTICE STRUCTURES; LITHIATION; LITHIUM COBALT OXIDE; OXYGEN CONTENT; OXYGEN DEFICIENCY; OXYGEN PARTIAL PRESSURE; PREPARATION PARAMETERS; SPUTTER-DEPOSITED THIN FILMS; SUBSTRATE TEMPERATURE; THIN FILM ELECTRODES; XRD MEASUREMENTS;

ELECTRIC CONDUCTIVITY; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; INTERCALATION COMPOUNDS; ION BEAMS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

VAPOR DEPOSITION;

EID: 84857365948     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.12.065     Document Type: Article

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