Influence of growth parameters on texture of ZnO nanorods by using electrochemical deposition at low temperatures

Solid State Ionics

Volumn 209-210, Issue , 2012, Pages 43-50

  Hsieh, Chien Te ^a   Yang, Shu Ying ^a   Gu, Jun Lun ^a   Jiang, Yun Ru ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Arrhenius plots; Electrochemical deposition; Low growth temperature; Nanorods; Zinc oxide

Indexed keywords

ANNEALING TEMPERATURES; APPARENT ACTIVATION ENERGY; APPLIED POTENTIALS; AQUEOUS ELECTROLYTE; AS-GROWN; CATHODIC ELECTRODEPOSITION; CONDUCTING SUBSTRATES; CRYSTALLINE STRUCTURE; DEPOSITION POTENTIAL; ELECTROCHEMICAL DEPOSITION; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GROWTH MECHANISMS; GROWTH PARAMETERS; INDIUM TIN OXIDE SUBSTRATES; INTENSITY RATIO; LATTICE FRINGES; LOW GROWTH TEMPERATURE; LOW TEMPERATURES; PARAMETER SETTING; SEED LAYER; STRUCTURAL TRANSFORMATION; TEXTURED GROWTH; WURZITE; X RAY PHOTONS; ZNO; ZNO NANOROD; ZNO NANOROD ARRAYS;

ACTIVATION ENERGY; ARRHENIUS PLOTS; CRYSTALLINE MATERIALS; ELECTRODEPOSITION; GROWTH TEMPERATURE; INDIUM COMPOUNDS; NANORODS; REDUCTION; TEXTURES; TIN; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 84857052569     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2011.12.010     Document Type: Article

References (29)

1. M. Lai, and D.J. Riley Chem. Mater. 18 2006 2233
2. M. Izaki, and T. Omi Appl. Phys. Lett. 68 1996 2439
3. T.Y. Liu, H.C. Liao, C.C. Lin, S.H. Hu, and S.Y. Chen Langmuir 22 2006 5804
4. Y.J. Tak, and K.J. Yong J. Phys. Chem. C 112 2008 74
5. S. Fujitsu Solid State Ionics 48 1991 309
6. F. Xu, X.F. Liu, S.D. Tse, F. Cosandey, and B.H. Kear Chem. Phys. Lett. 449 2007 175
7. R.D. Sun, A. Nakajima, A. Fujishima, T. Watanabe, and K. Hashimoto J. Phys. Chem. B 105 2001 1984
8. X. Gan, X. Gao, J. Qiu, and X. Li Appl. Surf. Sci. 254 2008 3839
9. R. Liu, A.A. Vertegel, E.W. Bohannan, T.A. Sorenson, and J.A. Switzer Chem. Mater. 13 2001 508
10. S. Wei, J. Lian, X. Chen, and Q. Jiang Appl. Surf. Sci. 254 2008 6605
11. J.S. Wellings, N.B. Chaure, S.N. Heavens, and I.M. Dharmadasa Thin Solid Films 516 2008 3893
12. Y.F. Yuan, J.P. Tu, H.M. Wu, B. Zhang, X.H. Huang, and X.B. Zhao J. Electrochem. Soc. 153 2006 A1719
13. D.C. Olson, S.E. Shaheen, R.T. Collins, and D.S. Ginley J. Phys. Chem. C 111 2007 16670
14. X. Feng, L. Shi, S. Wang, and S. Ma Solid State Ionics 179 2008 2077
15. D. Nezaki, M. Yasuda, T. Yasui, and M. Takata Solid State Ionics 172 2004 353
16. S.H. Yi, S.K. Choi, J.M. Jang, J.A. Kim, and W.G. Jung J. Colloid Interface Sci. 313 2007 705
17. K. Takanezaw, K. Hirota, Q.-S. Wei, K. Tajima, and K. Hashimoto J. Phys. Chem. C 111 2007 7218
18. R. Jayakrishnan, and G. Hodes Thin Solid Films 440 2003 19
19. C.T. Hsieh, Y.T. Lin, J.Y. Lin, and J.L. Wei Mater. Chem. Phys. 114 2009 702
20. C.T. Hsieh, Y.T. Lin, J.Y. Lin, and J.L. Wei Powder Technol. 192 2009 16
21. M. Izaki, and T. Omi J. Electrochem. Soc. 143 1996 L53
22. G.R. Li, X.H. Lu, C.Y. Su, and Y.X. Tong J. Phys. Chem. C 112 2008 2927
23. Y.H. Zheng, C.Q. Chen, Y.Y. Zhan, X.Y. Lin, Q. Zhang, K.M. Wei, J.F. Zhu, and Y.J. Zhu Inorg. Chem. 46 2007 6675
24. X.M. Hou, F. Zhou, B. Yu, and W.M. Liu Mater. Sci. Eng., A 452-453 2007 732
25. C. Tazlaoanua, L. Ion, I. Enculescu, M. Sima, M. Enculescu, E. Matei, R. Neumann, R. Bazavan, D. Bazavan, and S. Antohe Physica E 40 2008 2504
26. T. Pauporté, and D. Lincot Electrochim. Acta 45 2000 3345
27. Y. Hames, Z. Alpaslan, A. Kösemen, S.E. San, and Y. Yerli Sol. Energy 84 2010 426
28. M. Guo, C.Y. Yang, M. Zhang, Y.J. Zhang, T. Ma, and X.D. Wang Electrochim. Acta 53 2008 4633
29. M. Fahoume, O. Maghfoul, M. Aggour, B. Hartiti, F. Chraïbi, and A. Ennaoui Sol. Energy Mater. Sol. Cells 90 2003 1437