Patterning of polystyrene thin films by solvent-assisted imprint lithography and controlled dewetting

Microelectronic Engineering

Volumn 94, Issue , 2012, Pages 33-37

  Lai, Kuan Liang ^a   Hsiao, Shiau Fong ^a   Hon, Min Hsiung ^a   Leu, Ing Chi ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

Author keywords

Acetone; Dewetting; Polymer; Polystyrene sphere; Solvent assisted imprinting lithography

Indexed keywords

COMPLEX PATTERN; CONVENTIONAL PHOTOLITHOGRAPHY; DE-WETTING; DEWETTING PROCESS; IMPRINT LITHOGRAPHY; IMPRINTING LITHOGRAPHY; INNOVATIVE APPROACHES; LOW PRESSURES; MICRO-LENS; MICROPATTERNS; ORDERED NANOSTRUCTURES; POLYMER (SOLID); POLYMER THIN FILMS; POLYSTYRENE SPHERE; POLYSTYRENE THIN FILMS; RESIDUAL LAYERS; ROOM TEMPERATURE; SPHERE ARRAY; SPINODAL DEWETTING; SUBMICROMETERS; TEMPLATED;

ACETONE; DOMES; FILM PREPARATION; PHOTOLITHOGRAPHY; PHOTONIC CRYSTALS; POLYSTYRENES; SOLVENTS; SPHERES; THIN FILMS;

PROCESS CONTROL;

EID: 84857024594     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.11.009     Document Type: Article

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