Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films

Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 1, 2012, Pages 267-272

  Feng, Quanyu ^a   Wang, Weiyan ^a   Jiang, Kemin ^a   Huang, Jinhua ^a   Zhang, Yulong ^a   Song, Weijie ^a   Tan, Ruiqin ^b  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

^b NINGBO UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AL CONTENT; AL-DOPING; ALUMINUM-DOPED ZINC OXIDE; AZO FILMS; AZO THIN FILMS; CARBON CONCENTRATIONS; CARBON CONTAMINATION; DC MAGNETRON SPUTTERING; DEPOSITION CONDITIONS; FILM SURFACES; HIGH WORK FUNCTION; OZONE TREATMENT; POST TREATMENT; SUBSTRATE TEMPERATURE; ULTRA-VIOLET; UV-OZONE; UV-OZONE TREATMENT;

ALUMINUM; ALUMINUM COATINGS; CHIP SCALE PACKAGES; DEPOSITION; OPTICAL FILMS; OZONE; SEMICONDUCTOR DOPING; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

WORK FUNCTION;

EID: 84856948246     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-011-0400-3     Document Type: Article

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