Nanoporous Pt@Au xCu 100-x by hydrogen evolution assisted electrodeposition of Au xCu 100-x and galvanic replacement of Cu with Pt: Electrocatalytic properties

Langmuir

Volumn 28, Issue 6, 2012, Pages 3306-3315

  Cherevko, Serhiy ^a,b   Kulyk, Nadiia ^a   Chung, Chan Hwa ^a  

^a Sungkyunkwan University   (South Korea)

^b MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC MEDIUMS; AIR ENVIRONMENT; ALKALINE MEDIA; CODEPOSITION; DEPOSITED FILMS; ELECTROCATALYTIC PROPERTIES; GALVANIC DISPLACEMENT; HYDROGEN EVOLUTION; MATRIX; MECHANICAL STRESS; METHANOL OXIDATION; NANO-POROUS; SURFACE RATIO;

ELECTROCATALYSTS; ELECTRODEPOSITION; ELECTRODES; HYDROGEN; METAL IONS; METHANOL; PLATINUM; STRESSES;

COPPER;

EID: 84856873477     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la203625e     Document Type: Article

References (62)

1. Wittstock, A.; Zielasek, V.; Biener, J.; Friend, C. M.; Baumer, M. Science 2010, 327 (5963) 319-322
2. Zielasek, V.; Jürgens, B.; Schulz, C.; Biener, J.; Biener, M. M.; Hamza, A. V.; Bäumer, M. Angew. Chem., Int. Ed. 2006, 45 (48) 8241-8244
3. Campbell, C. T. Science 2004, 306, 234-5
4. Haruta, M. Catal. Today 1997, 36, 153-166
5. Chen, M. S.; Goodman, D. W. Science 2004, 306, 252-5
6. Nakanishi, H.; Grzybowski, B. A. J. Phys. Chem. Lett. 2010, 1 (9) 1428-1431
7. Cherevko, S.; Chung, C.-H. Sens. Actuators, B 2009, 142 (1) 216-223
8. Biener, J.; Wittstock, A.; Zepeda-Ruiz, L. A.; Biener, M. M.; Zielasek, V.; Kramer, D.; Viswanath, R. N.; Weissmuller, J.; Baumer, M.; Hamza, A. V. Nature Mater. 2009, 8 (1) 47-51
9. Zhang, H.; Xu, J. J.; Chen, H. Y. J. Phys. Chem. C 2008, 112, 13886-13892
10. Ye, W.; Yan, J.; Ye, Q.; Zhou, F. J. Phys. Chem. C 2010, 219-228
11. Christensen, C. H.; Norskov, J. K. Science 2010, 327, 278
12. Corma, A.; Garcia, H. Chem. Soc. Rev. 2008, 37, 2096-126
13. Haruta, M.; Kobayashi, T.; Sano, H.; Yamada, N. Chem. Lett. 1987, 16, 405-408
14. Haruta, M. ChemPhysChem 2007, 8, 1911-3
15. Sanchez-Castillo, M. A.; Couto, C.; Kim, W. B.; Dumesic, J. A. Angew. Chem. 2004, 116, 1160-1162
16. Xu, C.; Su, J.; Xu, X.; Liu, P.; Zhao, H.; Tian, F.; Ding, Y. J. Am. Chem. Soc. 2006, 129 (1) 42-43
17. Yu, C.; Jia, F.; Ai, Z.; Zhang, L. Chem. Mater. 2007, 19, 6065-6067
18. Nagaraju, D. H.; Lakshminarayanan, V. J. Phys. Chem. C 2009, 113, 14922-14926
19. Zhang, J.; Liu, P.; Ma, H.; Ding, Y. J. Phys. Chem. C 2007, 111, 10382-10388
20. Du, Y.; Xu, J.-J.; Chen, H.-Y. Electrochem. Commun. 2009, 11, 1717-1720
21. Cherevko, S.; Xing, X.; Chung, C.-H. Electrochim. Acta 2011, 56, 5771-5775
22. Zeis, R.; Mathur, a.; Fritz, G.; Lee, J.; Erlebacher, J. J. Power Sources 2007, 165, 65-72
23. Ge, X.; Wang, R.; Liu, P.; Ding, Y. Chem. Mater. 2007, 19, 5827-5829
24. Lang, X.; Guo, H.; Chen, L.; Kudo, A.; Yu, J.; Zhang, W.; Inoue, A.; Chen, M. J. Phys. Chem. C 2010, 114, 2600-2603
25. Xu, C.; Wang, R.; Chen, M.; Zhang, Y.; Ding, Y. Phys. Chem. Chem. Phys. 2010, 12, 239-46
26. Snyder, J.; Asanithi, P.; Dalton, A. B.; Erlebacher, J. Adv. Mater. 2008, 20, 4883-4886
27. Cherevko, S.; Chung, C.-H. Electrochem. Commun. 2011, 13, 16-19
28. Cherevko, S.; Xing, X.; Chung, C.-H. Electrochem. Commun. 2010, 12 (3) 467-470
29. Cherevko, S.; Chung, C.-H. Electrochim. Acta 2010, 55 (22) 6383-6390
30. Nikolic, N. D.; Popov, K. I.; Pavlovic, L. J.; Pavlovic, M. G. J. Electroanal. Chem. 2006, 588 (1) 88-98
31. Ding, Y.; Erlebacher, J. J. Am. Chem. Soc. 2003, 125 (26) 7772-7773
32. Lohrberg, K.; Kohl, P. Electrochim. Acta 1984, 29 (11) 1557-1561
33. Nikolic, N.; Brankovic, G.; Pavlovic, M.; Popov, K. I. J. Electroanal. Chem. 2008, 621, 13-21
34. Kim, J. H.; Kim, R. H.; Kwon, H. S. Electrochem. Commun. 2008, 10, 1148-1151
35. Li, Y.; Jia, W.-Z.; Song, Y.-Y.; Xia, X.-H. Chem. Mater. 2007, 19 (23) 5758-5764
36. Shin, H.-C.; Liu, M. Chem. Mater. 2004, 16 (25) 5460-5464
37. Ding, Y.; Kim, Y. J.; Erlebacher, J. Adv. Mater. 2004, 16 (21) 1897-1900
38. Ateya, B. G.; Geh, G.; Carim, A. H.; Pickering, H. W. J. Electrochem. Soc. 2002, 149, B27
39. Winand, R. Electrochim. Acta 1998, 43 (19-20) 2925-2932
40. Winand, R. J. Appl. Electrochem. 1991, 21, 377-385
41. Cherevko, S.; Chung, C.-H. Talanta 2010, 80 (3) 1371-1377
42. Woods, R. Electroanalytical chemistry. In Electroanalytical Chemistry; Bard, A. J., Ed.; Marcel Dekker: New York, 1976; Vol. 9.
43. Shin, H.-C.; Dong, J.; Liu, M. Adv. Mater. 2003, 15 (19) 1610-1614
44. Jankowski, a.; Saw, C.; Harper, J.; Vallier, B.; Ferreira, J.; Hayes, J. Thin Solid Films 2006, 494, 268-273
45. Djokić, S. S. Modern Aspects of Electrochemistry, No. 48: Electrodeposition, theory and practice; Springer: New York, 2010.
46. Popov, K. I.; Djokić, S. S.; Grgur, B. N. Fundamental Aspects of Electrometallurgy; Kluwer Academic Publishers: New York, 2002.
47. Vegard, L. Z. Phys. A: Hadrons Nucl. 1921, 5 (1) 17-26
48. Patterson, A. Phys. Rev. 1939, 56, 978-982
49. Takeuchi, S. Scr. Mater. 2001, 44 (8-9) 1483-1487
50. Sarkar, A.; Manthiram, A. J. Phys. Chem. C 2010, 114, 4725-4732
51. Plowman, B. J.; O'Mullane, A. P.; Bhargava, S. K. Faraday Discuss. 2011, 152, 43
52. O'Mullane, A. P.; Bhargava, S. K. Electrochem. Commun. 2011, 13, 852-855
53. Borkowska, Z.; Tymosiak-Zielinska, A.; Nowakowski, R. Electrochim. Acta 2004, 49, 2613-2621
54. Luo, J.; Njoki, P. N.; Lin, Y.; Mott, D.; Wang, L.; Zhong, C.-J. Langmuir 2006, 22, 2892-8
55. Mott, D.; Luo, J.; Njoki, P.; Lin, Y.; Wang, L.; Zhong, C. Catal. Today 2007, 122, 378-385
56. Yang, L.; Yang, W.; Cai, Q. J. Phys. Chem. C 2007, 111, 16613-16617
57. Borkowska, Z.; Tymosiak-Zielinska, A.; Nowakowski, R. Electrochim. Acta 2004, 49, 1209-1220
58. Assiongbon, K.; Roy, D. Surf. Sci. 2005, 594, 99-119
59. O'Mullane, A. P.; Ippolito, S. J.; Sabri, Y. M.; Bansal, V.; Bhargava, S. K. Langmuir 2009, 25, 3845-52
60. Li, Y.; Song, Y.-Y.; Yang, C.; Xia, X.-H. Electrochem. Commun. 2007, 9 (5) 981-988
61. Braidy, N.; Purdy, G.; Botton, G. Acta Mater. 2008, 56, 5972-5983
62. Deng, L.; Hu, W.; Deng, H.; Xiao, S. J. Phys. Chem. C 2010, 114, 11026-11032