Ultracompact polarization converter with a dual subwavelength trench built in a silicon-on-insulator waveguide

Optics Letters

Volumn 37, Issue 3, 2012, Pages 365-367

  Velasco, Aitor V ^b   Calvo, María L ^b   Cheben, Pavel ^a   Ortega Moñux, Alejandro ^c   Schmid, Jens H ^a   Ramos, Carlos Alonso ^c   Fernandez, Íñigo Molina ^c   Lapointe, Jean ^a   Vachon, Martin ^a   Janz, Siegfried ^a   Xu, Dan Xia ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^c UNIVERSITY OF MÁLAGA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

3 DB BANDWIDTH; CONVERTER LOSS; ETCHING PROCESS; EXTINCTION RATIOS; POLARIZATION CONVERSION; POLARIZATION CONVERTERS; POLARIZATION ROTATION; REACTIVE ION ETCH LAG; SILICON ON INSULATOR; SILICON ON INSULATOR WAVEGUIDE; SINGLE-MASK; SUB-WAVELENGTH; VERTICAL ASYMMETRY; WAVEGUIDE CORE;

OPTICAL WAVEGUIDES; REACTIVE ION ETCHING;

POLARIZATION;

SILICON;

ARTICLE; LIGHT RELATED PHENOMENA; ROTATION;

OPTICAL PROCESSES; ROTATION; SILICON;

EID: 84856634508     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.37.000365     Document Type: Article

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