Superhard tungsten tetraboride films prepared by pulsed laser deposition method

ACS Applied Materials and Interfaces

Volumn 3, Issue 9, 2011, Pages 3738-3743

  Rau, Julietta V ^a   Latini, Alessandro ^b   Teghil, Roberto ^c,d   De Bonis, Angela ^c,d   Fosca, Marco ^a   Caminiti, Ruggero ^b   Rossi Albertini, Valerio ^a  

^a CNR   (Italy)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c UNIVERSITY OF BASILICATA   (Italy)

^d CNR IMIP UOS di Potenza   (Italy)

Author keywords

hardness; pulsed laser deposition; superhard; tungsten diboride; tungsten tetraboride; tungsten tetraboride film

Indexed keywords

BEAM SYNTHESIS; DEPOSITED FILMS; FILM HARDNESS; ND:GLASS LASER; POLY-CRYSTALLINE BULK; PULSE DURATIONS; RESEARCH ACTIVITIES; SCANNING ELECTRONS; SUPERHARD; SUPERHARD MATERIAL; SUPERHARDNESS; VICKERS MICROHARDNESS;

ATOMIC FORCE MICROSCOPY; BORIDES; ELECTRON BEAMS; FILM PREPARATION; FILMS; GLASS LASERS; HARDNESS; NEODYMIUM LASERS; PULSED LASER DEPOSITION; SILICON COMPOUNDS; TUNGSTEN; X RAY DIFFRACTION;

PULSED LASERS;

BORON DERIVATIVE; SILICON DIOXIDE; TUNGSTEN;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; SCANNING ELECTRON MICROSCOPY; SOLID STATE LASER; SYNTHESIS; X RAY DIFFRACTION;

BORON COMPOUNDS; LASERS, SOLID-STATE; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; SILICON DIOXIDE; TUNGSTEN; X-RAY DIFFRACTION;

EID: 84856490209     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am200927q     Document Type: Article

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