Thin cuprous oxide films prepared by thermal oxidation of copper foils with water vapor

Thin Solid Films

Volumn 520, Issue 7, 2012, Pages 2679-2682

  Liang, Jianbo ^a   Kishi, Naoki ^a   Soga, Tetsuo ^a   Jimbo, Takashi ^a   Ahmed, Mohsin ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cuprous oxide; Oxide; Semiconducting materials; Surfaces; Water vapor

Indexed keywords

COPPER FOILS; CUPROUS OXIDE; CURRENT VOLTAGE; HIGH PURITY; HIGH QUALITY CRYSTALS; LARGE-GRAIN; PREPARATION METHOD; SEMICONDUCTING MATERIALS; THERMAL OXIDATION; X-RAY DIFFRACTION STUDIES;

COPPER; FILM PREPARATION; OXIDES; SEMICONDUCTING FILMS; SURFACES; WATER VAPOR; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 84856382158     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.11.037     Document Type: Article

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