Effect of silicon and germanium alloying additions on the passivation characteristics of Fe 3Al intermetallic in sulphuric acid solution

Electrochimica Acta

Volumn 62, Issue , 2012, Pages 305-312

  Rosalbino, F ^a   Carlini, R ^b,c   Parodi, R ^b   Zanicchi, G ^b,c  

^a POLITECNICO DI TORINO   (Italy)

^b UNIVERSITY OF GENOA   (Italy)

^c Genoa Research Unit of the National Consortium of Materials Science and Technology INSTM   (Italy)

Author keywords

Electrochemical impedance spectroscopy (EIS); Iron aluminides; Passive film; Potentiodynamic polarization; XPS

Indexed keywords

ALLOYING ADDITIONS; ARC-MELTING; ARGON ATMOSPHERES; ELECTROCHEMICAL STUDIES; IRON ALUMINIDES; PASSIVATION PROPERTIES; PASSIVE FILMS; POTENTIODYNAMICS; POTENTIOSTATICS; PROTECTIVE PROPERTIES; PURE ELEMENTS; SINGLE PHASE MICROSTRUCTURE; SURFACE LAYERS; XPS ANALYSIS;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMICAL PROPERTIES; GERMANIUM; GERMANIUM OXIDES; INTERMETALLICS; IRON; PASSIVATION; POLARIZATION; POTENTIODYNAMIC POLARIZATION; SILICON; SILICON COMPOUNDS; SILICON OXIDES; SOLDERING ALLOYS; SULFURIC ACID; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM;

EID: 84856236327     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.12.031     Document Type: Article

References (39)

1. C.T. Liu, J.O. Stiegler, and F.H. Froes 10th Ed. Metals Handbook vol. 2 1990 ASM Metals Park, USA
2. C.T. Liu, and K.S. Kumar J. Metals 45 1993 38
3. S. Frangini Corrosion 55 1999 89
4. H.C. Choe, H.S. Kim, D.C. Choi, and K.H. Kim J. Mater. Sci. 32 1997 1221
5. N. De Cristofaro, S. Frangini, and A. Mignone Corros. Sci. 38 1996 307
6. R. Balasubramaniam Scripta Mater. 34 1996 127
7. S. Frangini, J. Lascovich, and N. De Cristofaro Mater. Sci. Forum 185-188 1995 1041
8. S. Frangini, N. De Cristofaro, J. Lascovich, and A. Mignone Corros. Sci. 35 1993 153
9. S. Frangini, N. De Cristofaro, A. Mignone, J. Lascovich, and R. Giorgi Corros. Sci. 39 1997 1431
10. D. Schaepers, and H.H. Strebblow Corros. Sci. 39 1997 2193
11. S. Frangini, R. Giorni, and J. Lascovich Surf. Interface Anal. 21 1994 435
12. Y.F. Zhu, C.T. Liu, and C.H. Chen Scripta Mater. 34 1996 1435
13. C.G. McKamey, and C.T. Liu Scripta Metall. 22 1988 1679
14. C.G. McKamey, and C.T. Liu Scripta Metall. 24 1990 1219
15. A. Agarwal, and R. Balasubramaniam Bull. Mater. Sci. 19 1996 91
16. V.S. Rao Corros. Sci. 47 2005 183
17. A. Agarwal, M.J. Akhtar, and R. Balasubramaniam J. Mater. Sci. 31 1996 5207
18. W. Kraus, and G. Nolze J. Appl. Cryst. 29 1996 301
19. D. Guski, LCLSQ (Mark III) - Crystallographic lattice constant least-squares refinement program, 1981.
20. D.A. Shirley Phys. Rev. B 5 1972 4709
21. J.R. Mc Donald Impedance Spectroscopy 1987 Wiley New York
22. Z. Stoynov Electrochim. Acta 35 1990 1493
23. G.E. Mc Guire, G.K. Schweitzer, and T.A. Carlson Inorg. Chem. 12 1973 2451
24. N.S. Mcintyre, and D.G. Zetaruk Anal. Chem. 49 1977 1521
25. T.L. Barr J. Phys. Chem. 82 1978 1801
26. P. Marcus, and M.E. Bussell Appl. Surf. Sci. 59 1992 7
27. B.J. Lindberg, K. Hamrin, G. Johansson, U. Gelius, A. Fahlman, C. Nordling, and K. Siegbahn Phys. Scripta 1 1970 286
28. C.D. Wagner, D.A. Zatko, and R.H. Raymond Anal. Chem. 52 1980 1445
29. G.E. Mouilenberg Handbook of X-ray Photon Electron Spectroscopy 1978 Perkin-Elmer Corp.
30. E. McCafferty, M.K. Barnett, and J.S. Murday Corros. Sci. 28 1988 559
31. K. Asami, and K. Hashimoto Corros. Sci. 17 1977 559
32. J.A. Taylor J. Vac. Sci. Technol. 20 1982 751
33. I. Olefjord, H.J. Mathieu, and P. Marcus Surf. Interface Anal. 15 1990 681
34. V.S. Rao Electrochim. Acta 49 2004 4533
35. G. Sharma, P.R. Singh, R.K. Sharma, K.B. Gaonkar, and R.V. Ramanujan J. Mater. Eng. Perform. 16 2007 779
36. M.E. Striefler, and G.R. Barsch Phys. Status Solidi 67 1975 143
37. S.T. Pantelides, and W.A. Harrison Phys. Rev. B 13 1976 2667
38. C.G. McKamey, and C.T. Liu Scripta Metall. Mater. 24 1992 2119
39. R. Balasubramaniam J. Alloys Compd. 253-254 1997 148