Hydrogen-induced blistering mechanisms in thin film coatings

Journal of Physics Condensed Matter

Volumn 24, Issue 5, 2012, Pages

  Kuznetsov, A S ^a   Gleeson, M A ^a   Bijkerk, F ^a,b  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BLISTER FORMATION; HIGH DENSITY; HYDROGENATION PROCESS; INCIDENT FLUX; ION ENERGIES; LOW DENSITY; LOW ENERGY IONS; MULTI-LAYER-COATING; MULTILAYER STRUCTURES; THIN-FILM COATINGS;

COATINGS; HYDROGEN; IONS; MULTILAYERS;

FILM PREPARATION;

HYDROGEN; ION; METAL; MOLYBDENUM; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY; PHYSICAL CHEMISTRY; SURFACE PROPERTY; TIME; TRANSMISSION ELECTRON MICROSCOPY;

CHEMISTRY, PHYSICAL; HYDROGEN; IONS; METALS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, TRANSMISSION; MOLYBDENUM; SILICON; SURFACE PROPERTIES; TIME FACTORS;

EID: 84856082930     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/24/5/052203     Document Type: Article

References (22)

1. Giguere A, Desrosiers N and Terreault B 2005 Appl. Phys. Lett. 87 211911
2. Goudeau P, George M and Coupeau C 2004 Appl. Phys. Lett. 84 8946
3. Lee J K, Lin Y, Jia Q X, Hochbauer T, Jung H S, Shao L, Misra A and Nastasi M 2006 Appl. Phys. Lett. 89 101901
4. Usenko A Y and Ulyashin A G 2002 Japan. J. Appl. Phys. 41 50213
5. Chen P et al 2005 Appl. Phys. Lett. 86 031904
6. Ma Y, Job R, Dungen W, Huang Y L, Fahrner W R, Beaufort M F, Rousselet S and Horstmann J T 2005 Appl. Phys. Lett. 86 252109
7. Hutchinson J W, Thouless M D and Liniger E G 1992 Acta Metall. Mater. 40 295308
8. Jagla E A 2007 Phys. Rev. B 75 085405
9. Colin J, Coupeau C, Durinck J and Grilhe J 2009 Europhys. Lett. 86 54002
10. Audoly B 1999 Phys. Rev. Lett. 83 41247
11. Peyla P 2000 Phys. Rev. E 62 R15014
12. Goudeau P, Villain P, Tamura N and Padmore H A 2003 Appl. Phys. Lett. 83 513
13. Okba F, Cherkashin N, Di Z, Nastasi M, Rossi F, Merabet A and Claverie A 2010 Appl. Phys. Lett. 97 031917
14. Shao L et al 2005 Appl. Phys. Lett. 87 091902
15. Hochbauer T, Misra A, Hattar K and Hoagland R G 2005 J. Appl. Phys. 98 123516
16. Nan L, Martin M S, Anderoglu O, Misra A, Shao L, Wang H and Zhang X 2009 J. Appl. Phys. 105 123522
17. Demkowicz M J, Bhattacharyya D, Usov I, Wang Y Q, Nastasi M and Misra A 2010 Appl. Phys. Lett. 97 161903
18. Pelizzo M G, Corso A J, Zuppella P, Windt D L, Mattei G and Nicolosi P 2011 Opt. Express 19 1483844
19. Nedelcu I, van de Kruijs R W E, Yakshin A E, Tichelaar F, Zoethout E, Louis E, Enkisch H, Muellender S and Bijkerk F 2006 Thin Solid Films 515 4348
20. de Rooij-Lohmann V I T A, Kozhevnikov I V, Peverini L, Ziegler E, Cuerno R, Bijkerk F and Yakshin A E 2010 Appl. Surf. Sci. 256 50114
21. Nedelcu I, van de Kruijs R W E, Yakshin A E and Bijkerk F 2008 J. Appl. Phys. 103 083549
22. Zoethout E, Sipos G, van de Kruijs R, Yakshin A, Louis E, Muellender S and Bijkerk F 2003 Proc. SPIE 5037 872