Superhydrophobicity of electrospray-synthesized fluorinated silica layers

Journal of Colloid and Interface Science

Volumn 368, Issue 1, 2012, Pages 599-602

  Kim, Eun Kyeong ^a   Lee, Chul Sung ^a   Kim, Sang Sub ^a  

^a Inha University   (South Korea)

Author keywords

Electrospray; Fluorination; Hydrophobicity; Silica

Indexed keywords

CHEMICAL ROUTES; ELECTROSPRAYING; ELECTROSPRAYS; LIQUID DROPLETS; NANO-SCALE SURFACE ROUGHNESS; PRECURSOR SOLUTIONS; SILICA LAYERS; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; SURFACE FRACTION; ULTRAVIOLET RESISTANCES; WATER REPELLENCY; WORK OF ADHESION;

ADHESION; FLUORINATION; FLUORINE; HALOGENATION; HYDROPHOBICITY; SILICA; SURFACE ROUGHNESS;

SILICON COMPOUNDS;

SILICON DIOXIDE; WATER;

ADHESION; ARTICLE; ELECTROSPRAY; FLUORINATION; FRACTIONATION; HYDROPHOBICITY; PRIORITY JOURNAL; SYNTHESIS; THERMOSTABILITY; ULTRAVIOLET RADIATION;

GELS; HALOGENATION; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; NANOPARTICLES; SILANES; SILICON DIOXIDE; SURFACE PROPERTIES; TEMPERATURE; ULTRAVIOLET RAYS; WATER; WETTABILITY;

EID: 84855832902     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.11.047     Document Type: Article

References (25)

1. Wu L.Y.L., Ngian S.K., Chen Z., Xuan D.T.T. Appl. Surf. Sci. 2011, 257:2965.
2. Howarter J.A., Youngblood J.P. Adv. Mater. 2007, 19:3838.
3. Liu L., Zhao J., Zhang Y., Zhao F., Zhang Y. J. Colloid Interf. Sci. 2011, 358:277.
4. Patankar N.A. Langmuir 2004, 20:8209.
5. Bonn D. Rev. Mod. Phys. 2009, 81:739.
6. Sun T., Feng L., Gao X., Jiang L. Acc. Chem. Res. 2005, 38:644.
7. Holloway P.J. Pestic. Sci. 1970, 1:156.
8. Munoz-Bonilla A., Bousquet A., Ibarboure E., Papon E., Labrugere C., Rodriquez-Hernandez J. Langmuir 2010, 26:16775.
9. Hsieh C.-T., Chen W.-Y., Wu F.-L. Carbon 2008, 46:1218.
10. Zhang L., Zhou Z., Cheng B., DeSimone J.M., Samulski E.T. Langmuir 2006, 22:8576.
11. Tian H., Yang T., Chen Y. Appl. Surf. Sci. 2009, 255:4289.
12. Jal P.K., Patel S., Mishra B.K. Talanta 2004, 62:1005.
13. Nakajima A., Abe K., Hashimoto K., Watanabe T. Thin Solid Films 2000, 376:140.
14. Li Y., Zhang J., Zhu S., Dong H., Jia F., Wang Z., Tang Y., Zhang L., Zhang S., Yang B. Langmuir 2010, 26:9842.
15. Singh S., Sasaki D.Y., Cesarano J., Hurd A.J. Thin Solid Films 1999, 339:209.
16. Makita K., Akamatsu Y., Takamatsu A. J. Sol-Gel Sci. Technol. 1999, 14:175.
17. Dzenis Y. Science 2004, 304:1917.
18. Jaworek A. J. Mater. Sci. 2007, 42:266.
19. Uematsu I., Matsumoto H., Morota K., Minagawa M., Tanioka A., Yamagata Y., Inoue K. J. Colloid Interf. Sci. 2004, 269:336.
20. Adamson A.W., Gast A.P. Physical Chemistry of Surfaces 1997, Wiley, New York. sixth ed.
21. Xiu Y., Zhu L., Hess D.W., Wong C.P. J. Phys. Chem. C 2008, 112:11403.
22. Cassie A.B.D., Baxter S. Trans. Faraday Soc. 1994, 40:546.
23. Vig J.R. J. Vac. Sci. Technol. A 1985, 3:1027.
24. Torchinsky I., Rosenman G. Nanoscale Res. Lett. 2009, 4:1209.
25. Xiu Y., Hess D.W., Wong C.P. J. Colloid Interf. Sci. 2008, 326:465.