Semiconductor oxides-sensitized photodegradation of fenamiphos in leaching water under natural sunlight

Applied Catalysis B: Environmental

Volumn 115-116, Issue , 2012, Pages 31-37

  Fenoll, José ^a   Hellín, Pilar ^a   Martínez, Carmen María ^a   Flores, Pilar ^a   Navarro, Simón ^b  

^a INSTITUTO MURCIANO DE INVESTIGACIÓN Y DESARROLLO AGRARIO Y ALIMENTARIO IMIDA   (Spain)

^b UNIVERSITY OF MURCIA   (Spain)

Author keywords

Fenamiphos; Fenamiphos sulfone; Fenamiphos sulfoxide; Photocatalytic oxidation; Semiconductor materials; Water detoxification

Indexed keywords

DEGRADATION RATE; FENAMIPHOS; FENAMIPHOS SULFOXIDE; LEACHING WATERS; NATURAL SUNLIGHT; PHOTO CATALYTIC DEGRADATION; PHOTO-CATALYTIC; PHOTOCATALYTIC OXIDATIONS; PILOT PLANT SCALE; PSEUDO-FIRST ORDER KINETICS; TIO; ZNO;

DEGRADATION; DETOXIFICATION; LEACHING; PHOTODEGRADATION; PILOT PLANTS; SEMICONDUCTOR MATERIALS; SODIUM; TIN; TIN OXIDES; TITANIUM DIOXIDE; TUNGSTEN;

ZINC OXIDE;

EID: 84855504335     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2011.12.023     Document Type: Article

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