Structural, electrical and optical studies of gold nanostructures formed by Ar plasma-assisted sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 272, Issue , 2012, Pages 193-197

  Siegel, J ^a   Kvitek O ^a   Slepicka P ^a   Nahlik J ^a   Heitz, J ^b   Svorcik V ^a  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

Annealing; Electrical and optical properties; Gold; Morphology; Nano structures; Sputtering

Indexed keywords

AFM; ANNEALED STRUCTURE; DIFFERENT THICKNESS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL MEASUREMENT; ELECTRICAL SHEET RESISTANCE; FREE CARRIERS; FREE CHARGE CARRIERS; GLASS SUBSTRATES; GOLD LAYER; GOLD NANOSTRUCTURES; GOLD STRUCTURES; OPTICAL STUDY; POST-DEPOSITION; ULTRA-THIN; VAN DER PAUW METHOD; VOLUME CONCENTRATION;

ANNEALING; GLASS; GOLD; GOLD COATINGS; GOLD DEPOSITS; MORPHOLOGY; NANOSTRUCTURES; OPTICAL PROPERTIES; SPUTTERING; SUBSTRATES;

ELECTRIC PROPERTIES;

EID: 84655170053     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.01.063     Document Type: Conference Paper

References (24)

1. Q.Ch. Sun Prog. Solid State Chem. 35 2007 1
2. E. Roduner Chem. Soc. Rev. 35 2006 583
3. S. Seino, T. Kinoshita, Y. Otome, T. Maki, T. Nakagawa, K. Okitsu, Y. Mizukoshi, T. Nakayama, T. Sekino, K. Niihara, and T.A. Yamamoto Scr. Mater. 51 2004 467
4. E. Piscopiello, L. Tapfer, M.V. Antisari, P. Paiano, P. Prete, and N. Lovergine Phys. Rev. B 78 2008 035305
5. I.D. Mor, Z. Barkay, N.F. Graint, A. Vaskevich, and I. Rubinstein Chem. Mater. 16 2004 3476
6. P. Slepička, E. Rebollar, J. Heitz, and V. Švorč ík Appl. Surf. Sci. 254 2008 3585
7. J. Siegel, P. Slepička, J. Heitz, Z. Kolská, P. Sajdl, and V. Švorčík Appl. Surf. Sci. 256 2010 2205
8. Z. Kolská, V. Švorčík, and J. Siegel Collect. Czech. Chem. C. 75 2010 315
9. H.J. Freund Surf. Sci. 500 2002 271
10. C. Burda, X. Chen, R. Narayanan, and M.A. El-Sayed Chem. Rev. 105 2005 1025
11. R. Burch Phys. Chem. Chem. Phys. 8 2006 5483
12. S.W. Boettcher, N.C. Strandwitz, M. Schierhorn, N. Lock, M.C. Lonergan, and G.D. Stucky Nat. Mater. 6 2007 592
13. U. Kreibig, G. Bour, A. Hilger, and M. Gartz Phys. Status Solidi. 175 1999 351
14. M. Osawa, K. Ataka, K. Yoshii, and Y. Nishikawa Appl. Spectrosc. 47 1993 1497
15. J. Gersten, and A. Nitzan J. Chem. Phys. 73 1980 3023
16. V. Švorčík, P. Slepička, J. Švorčíková, J. Zehentner, and V. Hnatowicz J. Appl. Polym. Sci. 99 2006 1698
17. V. Švorčík, T. Hubáček, P. Slepička, J. Siegel, Z. Kolská, O. Bláhová, A. Macková, and V. Hnatowicz Carbon 47 2009 1770
18. P. Slepička, Z. Kolská, J. Náhlík, V. Hnatowicz, and V. Švorčík Surf. Interface Anal. 41 2009 741
19. J. Tauc Amorphous and Liquid Semiconductors 1974 Springer Verlag Heidelberg
20. V. Švorčík, P. Slepička, J. Švorčíková, M. Špírková, J. Zehentner, and V. Hnatowiz J. Appl. Sci. 99 2006 1698
21. C. Kan, X. Zhu, and G.J. Wang J. Phys. Chem. B 110 2006 4651
22. H.B. Liu, J.A. Ascencio, M. Perez-Alvarez, and M. Yacaman J. Surf. Sci. 491 2001 288
23. G. Kalyuzhny, A. Vaskevich, M.A. Schneeweiss, and I. Rubinstein Chem. Eur. J. 8 2002 3850
24. C.N. R Rao, G.U. Kulkarni, P.J. Thomas, and P.P. Edwards Chem. Eur. J. 8 2002 1