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Electrochimica Acta

Volumn 59, Issue , 2012, Pages 382-386

The influence of nitrogen incorporation on the optical properties of anodic Ta 2O 5

(5) Di Franco, F a Santamaria, M a Di Quarto, F a Tsuji, E b Habazaki, H b

a UNIVERSITY OF PALERMO (Italy)

b HOKKAIDO UNIVERSITY (Japan)

Author keywords

Anodic Ta 2O 5; Band gap; GDOES; Nitrogen incorporation; XPS

Indexed keywords

AMMONIUM IONS; ANODIC FILMS; ANODIC OXIDES; ANODIC TA 2O 5; BAND GAPS; BATH COMPOSITIONS; DEPTH PROFILE; FILM COMPOSITION; FORMATION VOLTAGE; GDOES; GLOW-DISCHARGE OPTICAL EMISSION SPECTROSCOPY; NITROGEN INCORPORATION; NITROGEN SPECIES; PH DEPENDENCE; PHOTOELECTROCHEMICALS; SUB-BANDS; XPS ANALYSIS;

AMMONIUM COMPOUNDS; ANODIC OXIDATION; ELECTROCHEMISTRY; EMISSION SPECTROSCOPY; ENERGY GAP; GLOW DISCHARGES; NITROGEN; OPTICAL EMISSION SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL PROPERTIES;

EID: 84655167167 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2011.10.086 Document Type: Article

Times cited : (27)

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