Different stages during CVD deposition on porous substrates

Vacuum

Volumn 64, Issue 3-4, 2002, Pages 381-386

  Alonso, F ^a   Gomez Aleixandre C ^a   Albella, J M ^a   Marti F J ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

CVD; Porous substrates; Silicon oxynitride

Indexed keywords

GRAIN GROWTH; NUCLEATION; PARTICLE SIZE ANALYSIS; PORE SIZE; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SURFACE STRUCTURE; THIN FILMS;

SILICON OXYNITRIDE FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 8444241087     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00348-7     Document Type: Article

References (8)