Synthesis and self-assembly of diblock copolymers bearing 2-nitrobenzyl photocleavable side groups

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 50, Issue 3, 2012, Pages 599-608

  Schumers, Jean Marc ^a   Bertrand, Olivier ^a   Fustin, Charles André ^a   Gohy, Jean François ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

atom transfer radical polymerization (ATRP); micelles; microencapsulation; photocleavable group; self assembly; stimuli sensitive polymers; thin films

Indexed keywords

2-NITROBENZYL; CHEMICAL FUNCTIONS; FLUORESCENT DYES; HYDROPHILIC MOLECULES; MATRIX; MICROENCAPSULATION; NANO DOMAIN; PHOTOCLEAVABLE GROUP; POLY(ACRYLIC ACID ); PRECURSOR POLYMERS; SELECTIVE SOLVENTS; SILICON SUBSTRATES; STIMULI-SENSITIVE POLYMERS; UV IRRADIATION;

BLOCK COPOLYMERS; CARBOXYLIC ACIDS; ENCAPSULATION; FREE RADICAL REACTIONS; FUNCTIONAL POLYMERS; IRRADIATION; MICELLES; POLYSTYRENES; SELF ASSEMBLY; THIN FILMS;

ATOM TRANSFER RADICAL POLYMERIZATION;

EID: 84255162601     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.25069     Document Type: Article

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