Removal of pharmaceuticals using combination of UV/H2O 2/O3 advanced oxidation process

Water Science and Technology

Volumn 64, Issue 11, 2011, Pages 2230-2238

  Lester, Y ^a   Avisar, D ^a   Gozlan, I ^a   Mamane, H ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Advanced oxidation; Byproducts; EEO; Ozone; Pharmaceuticals; Photodegradation photolysis

Indexed keywords

ADVANCED OXIDATION; ADVANCED OXIDATION PROCESSES; ADVANCED OXIDATION TECHNOLOGY; ANTINEOPLASTIC DRUGS; CIPROFLOXACIN; DEGRADATION RATE; EEO; ELECTRICAL ENERGY; ELECTRICAL ENERGY CONSUMPTION; PHARMACEUTICAL CHEMICALS; TARGET COMPOUND; TRIMETHOPRIM; UV PHOTOLYSIS; WATER AND WASTEWATER;

BYPRODUCTS; DEGRADATION; DRUG PRODUCTS; EFFLUENTS; ENERGY EFFICIENCY; ENERGY UTILIZATION; OXIDATION; OZONE; PHOTODEGRADATION; PHOTOLYSIS; THERMOMECHANICAL PULPING PROCESS; WASTEWATER;

ANTIBIOTICS;

CIPROFLOXACIN; CYCLOPHOSPHAMIDE; HYDROGEN PEROXIDE; OZONE; TRIMETHOPRIM;

ANTIBIOTICS; DRUG; ELECTRICAL POWER; ENERGY EFFICIENCY; HYDROGEN PEROXIDE; OXIDATION; OZONE; PHOTODEGRADATION; POLLUTANT REMOVAL; ULTRAVIOLET RADIATION; WASTEWATER;

ARTICLE; CONTROLLED STUDY; DRUG DEGRADATION; OXIDATION; PHOTOLYSIS; ULTRAVIOLET RADIATION;

BIOREACTORS; HYDROXYL RADICAL; MOLECULAR STRUCTURE; OXIDATION-REDUCTION; OZONE; PHARMACEUTICAL PREPARATIONS; ULTRAVIOLET RAYS; WASTE DISPOSAL, FLUID; WATER POLLUTANTS, CHEMICAL;

EID: 84055191073     PISSN: 02731223     EISSN: None     Source Type: Journal    
DOI: 10.2166/wst.2011.079     Document Type: Article

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