Benefits and challenges of FDSOI technology for 14nm node

Proceedings - IEEE International SOI Conference

Volumn , Issue , 2011, Pages

  Faynot, Olivier ^a  

^a CEALETI ^*  (France)

Author keywords

[No Author keywords available]

Indexed keywords

STRAIN COMPATIBILITY;

NANOWIRES;

EID: 83455206178     PISSN: 1078621X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOI.2011.6081710     Document Type: Conference Paper

References (0)