Variability origins of FinFETs and perspective beyond 20nm node

Proceedings - IEEE International SOI Conference

Volumn , Issue , 2011, Pages

  Matsukawa, Takashi ^a   Liu, Yongxun ^a   Endo, Kazuhiko ^a   O'uchi, Shin Ichi ^a   Masahara, Meishoku ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FINFETS; PARASITIC RESISTANCES; UNDOPED CHANNELS; VT VARIATION;

INTEGRATED CIRCUITS;

EID: 83455206174     PISSN: 1078621X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOI.2011.6081713     Document Type: Conference Paper

References (0)