A 3D virtual reactor for simulation of silicon-based film production

American Society of Mechanical Engineers, Pressure Vessels and Piping Division (Publication) PVP

Volumn 491, Issue 2, 2004, Pages 59-67

  Krzhizhanovskaya, V V ^a,c   Zatevakhin, M A ^a   Ignatiev, A A ^a   Gorbachev, Yu E ^a   Goedheer, W J ^b   Sloot, P M A ^c  

^a PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^c UNIVERSITY OF AMSTERDAM   (Netherlands)

Author keywords

Grid computing; Plasma Enhanced Chemical Vapor Deposition; Problem Solving Environment

Indexed keywords

GRID COMPUTING; PROBLEM-SOLVING ENVIRONMENT (PSE); RADIO FREQUENCY (RF) OSCILLATING VOLTAGE;

COMPUTER ARCHITECTURE; COMPUTER SIMULATION; DEPOSITION; HEAT TRANSFER; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBLEM SOLVING;

THIN FILMS;

EID: 8344228613     PISSN: 0277027X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/PVP2004-3120     Document Type: Conference Paper

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