Facile fabrication of a superamphiphobic surface on the copper substrate

Journal of Colloid and Interface Science

Volumn 367, Issue 1, 2012, Pages 443-449

  Zhu, Xiaotao ^a,b   Zhang, Zhaozhu ^a   Xu, Xianghui ^a   Men, Xuehu ^a   Yang, Jin ^a,b   Zhou, Xiaoyan ^a,b   Xue, Qunji ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Controllable surface wettability; Re entrant texture; Simple fabrication; Solution immersion process; Superhydrophobic; Superoleophobic

Indexed keywords

COPPER SHEETS; COPPER SUBSTRATES; COPPER SURFACE; FACILE FABRICATION; GEOMETRICAL STRUCTURE; HEXADECANE; HIERARCHICAL STRUCTURES; IMMERSION TESTS; MICROFLOWERS; MICROSCOPIC STRUCTURES; NANOROD ARRAYS; OLEOPHOBICITY; ORGANIC LIQUID; OXIDATION PROCESS; SOLUTION-IMMERSION PROCESS; SPECIAL SURFACES; SUPERHYDROPHOBIC; SUPEROLEOPHOBIC; SURFACE CHEMICALS; SURFACE WETTABILITY; SYNERGISTIC EFFECT;

FABRICATION; FLUORINE; HYDROPHOBICITY; NANORODS; PARAFFINS; RHENIUM; SURFACE TENSION;

COPPER;

ALKALI; COPPER; HEXADECANE; NANOROD; WATER;

ARTICLE; BIOCHEMISTRY; COMPRESSION; FLUORINATION; HYDROPHOBICITY; INTERFACE PRESSURE; MICROSCOPY; OLEOPHOBICITY; OXIDATION; PRIORITY JOURNAL; SUPERAMPHIPHOBIC SURFACE; SURFACE PROPERTY; SURFACE TENSION;

COPPER; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; NANOSTRUCTURES; NANOTUBES; SURFACE PROPERTIES; SURFACE TENSION; WATER; WETTABILITY;

EID: 83355166785     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.10.008     Document Type: Article

References (42)

1. Yu Y., Zhao Z.H., Zheng Q.S. Langmuir 2007, 23:8212.
2. Callies M., Quéré D. Soft Mater 2005, 1:55.
3. Cao L., Hu H.H., Cao D. Langmuir 2007, 23:4310.
4. Otten A., Herminghaus S. Langmuir 2004, 20:2405.
5. Tutejia A., Choi W., Ma M.L., Mabry J.M., Mazzella S.A., Rutledge G.C., McKinley G.H., Cohen R.E. Science 2007, 318:1618.
6. Gong M.A., Xu X.L., Yang Z., Liu Y.Y., Lv H.F., Lv L. Nanotechnology 2009, 20:165602.
7. Mumm F., van Helvoort A.T.J., Sikorski P. ACS NANO 2009, 3:2647.
8. Yao X., Chen Q.W., Xu L., Li Q.K., Song Y.L., Gao X.F., Quéréand D., Jiang L. Adv. Funct. Mater. 2010, 20:656.
9. Kim H., Kim M.H., Kim J. J. Micromech. Microeng. 2009, 19:095002.
10. Chen W., Fadeev A.Y., Hsieh M.C., Oner D., Youngblood, McCarthy T.J. Langmuir 1999, 15:3395.
11. Shubuichi S., Yamamoto T., Onda T., Tsujii K. J. Colloid Interface Sci. 1998, 208:287.
12. Steele A., Bayer I., Loth E. Nano Lett. 2009, 9:501.
13. Wu W.C., Wang X.L., Wang D.A., Chen M., Zhou F., Liu W.M., Xue Q.J. Chem. Commum. 2009, 9:1043.
14. Sun T.L., Feng L., Gao X.F., Jiang L. Acc. Chem. Res. 2005, 38:644.
15. Feng Q., Wang J.N. New J. Chem. 2009, 33:734.
16. Guo Z.G., Liu W.M., Su B.L. J. Colloid Interface Sci. 2011, 353:335.
17. Tsougeni K., Papageorgiou D., Tserrpi A., Gogolides E. Lab Chip 2010, 10:492.
18. Coulson S.R., Woodward L.S., Badyal J.P.S., Brewer S.A., Willis C. Chem. Mater. 2000, 12:2031.
19. Gao L., McCarthy T.J. J. Am. Chem. Soc. 2007, 129:3804.
20. Tsujii K., Yamamoto T., Onda T., Shibuichi S. Angew. Chem., Int. Ed. Engl. 1997, 36:1011.
21. Wang D.A., Wang X.L., Liu X.J., Zhou F. J. Phys. Chem. C. 2010, 114:9938.
22. Chen L., Liu M.J., Lin L., Zhong T., Ma J., Song Y.L., Jiang L. Soft Matter. 2010, 6:2708.
23. Darmanin T., Guittard F. J. Colloid Interface Sci. 2009, 335:146.
24. Dufour R., Harnois M., Coffinier Y., Thomy V., Boukherroub R., Senez V. Langmuir 2010, 26:17242.
25. Meng H.F., Wang S.T., Xi J.M., Tang Z.Y., Jiang L. J. Phys. Chem. C. 2008, 112:11454.
26. Extrand C.W. Langmuir 2002, 18:7991.
27. Ahuja A., Taylor J.A., Lifton V., Sidorenko A.A., Salamon T.R., Lobaton E.J., Kolodner P., Krupenkin T.N. Langmuir 2008, 24:9.
28. Chhatre S.S., Choi W., Tuteja A., Park K.C., Mabry J.M., McKinley G.H., Cohen R.E. Langmuir 2010, 26:4027.
29. Cao L., Price T.P., Weiss M., Gao D. Langmuir 2008, 24:1640.
30. Yang J., Zhang Z.Z., Men X.H., Xu X.H., Zhu X.T. New J. Chem. 2011, 35:576.
31. Ellinas K., Tserepi A., Gogolides E. Langmuir 2011, 27:3960.
32. Darmanin T., Guittard F., Amigoni S., Givenchy E.T., Noblin X., Kofman R., Celestini F. Soft Matter. 2011, 7:1053.
33. Pan Q.M., Jin H.Z., Wang H.B. Nanotechnology 2007, 18:355605.
34. Chen X.H., Kong L.H., Dong D., Yang G.B., Yu L.G., Chen J.M., Zhang P.Y. J. Phys. Chem. C. 2009, 113:5396.
35. Zhang W.X., Wen X.G., Yang S.H., Berta Y., Wang Z.L. Adv. Mater. 2003, 15:822.
36. Zhang X., Shi F., Niu J., Jiang Y.G., Wang Z.Q. J. Mater. Chem. 2008, 18:621.
37. Cassie A.B.D., Baxter S. Trans. Faraday Soc. 1944, 40:546.
38. Wenzel R.N. Ind. Eng. Chem. 1936, 28:988.
39. Liu Y., Xiu Y.H., Hess D.W., Wong C.P. Langmuir 2010, 26:8908.
40. Xie Q., Xu J., Feng L., Jiang L., Tang W., Luo X., Han C.C. Adv. Mater. 2004, 16:302.
41. Nishino T., Meguro M., Nakamae K., Matsushita M., Ueda Y. Langmuir 1999, 15:4321.
42. Verho T., Bower C., Andrew P., Franssila S., Ikkala O., Ras R.H.A. Adv. Mater. 2010, 19:2213.