Supercapacitor behavior of spray deposited SnO2 thin films

International Journal of Nanoscience

Volumn 10, Issue 6, 2011, Pages 1245-1248

  Vijayakumar, S ^a   Nagamuthu, S ^a   Purushothaman, K K ^b   Dhanashankar, M ^c   Muralidharan, G ^a  

^a GANDHIGRAM RURAL UNIVERSITY   (India)

^b SRM Group Of Educational Institutions   (India)

^c KAMARAJ COLLEGE OF ENGINEERING AND TECHNOLOGY   (India)

Author keywords

Supercapacitors; thin films; tin oxide

Indexed keywords

ELECTROCHEMICAL TEST; NANOCRYSTALLINES; PREFERENTIAL ORIENTATION; SCAN RATES; SEM IMAGE; SPECIFIC CAPACITANCE; SPRAY PYROLYSIS METHOD; SPRAY-DEPOSITED; STRUCTURAL AND MORPHOLOGICAL PROPERTIES; SUPER CAPACITOR; TETRAGONAL RUTILE STRUCTURE; TIN OXIDE THIN FILM; XRD PATTERNS;

BEHAVIORAL RESEARCH; CAPACITORS; DEPOSITS; OXIDE MINERALS; SPRAY PYROLYSIS; THIN FILMS; TIN; TIN OXIDES; TINNING; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OXIDE FILMS;

EID: 82955194513     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X11008368     Document Type: Article

References (21)

1. P. Simon and Y. Gogotsi, Nat. Mater. 7, 845 (2008).
2. Y. Z. Zheng, H. Y. Ding and M. L. Zhang, Thin Solid Films 516, 7381 (2008).
3. M. Jayalakshmi and K. Balasubramanian, Int. J. Electrochem. Sci. 3, 1196 (2008).
4. Y. Zhang, H. Feng, X. Wu, L. Wang, A. Zhang, T. Xia, H. Dong, X. Li and L. Zhang, Int. J. Hydrogen Energy 34, 4889 (2009).
5. J. Zhao, S. Wu, J. Liu, H. Liu, S. Gong and D. Zhou, Sens. Actuators B 145, 788 (2010).
6. L. Yuan, K. Konstantinov, G. X. Wang, H. K. Liu and S. X. Dou, J. Power Sources 146, 180 (2005).
7. A. Y. E. Etre and S. M. Reda, Appl. Surf. Sci. 256, 6601 (2010).
8. P. S. Patil, S. B. Sadale, S. H. Mujawar, P. S. Shinde and P. S. Chigare, Appl. Surf. Sci. 253, 8560 (2007).
9. Z. A. Hu, Y. L. Xie, Y. X. Wang, L. P. Mo, Y. Y. Yang and Z. Y. Zhang, Mater. Chem. Phys. 114, 990 (2009).
10. T. P. Gujar, V. R. Shinde, C. D. Lokhande, W. Y. Kim, K. D. Jung and O. S. Joo, Electrochem. Commun. 9, 504 (2007).
11. B. Wang, K. Konstantinov, D. Wexler, H. Liu and G. X. Wang, Electrochim. Acta 54, 1420 (2009).
12. T. Lu, Y. Zhang, H. Li, L. Pan, Y. Li and Z. Sun, Electrochim. Acta 55, 4170 (2010).
13. D. Ham, J. Chang, S. H. Pthan, W. Y. Kim, R. S. Mane, B. N. Pawar, O. S. Joo, H. Chung, M. Y. Yoon and S. H. Han, Curr. Appl. Phys. 9, S98 (2009).
14. K. R. Prasad and N. Miura, Electrochem. Commun. 6, 849 (2004).
15. M. Wu, L. Zhang, D. Wang, C. Xiao and S. Zhang, J. Power Sources 175, 669 (2008).
16. K. Ravichandran, G. Muruganantham and B. Sakthivel, Phys. B 404, 4299 (2009).
17. A. N. Banerjee, S. Kundoo, P. Saha and K. K. Chattopadhyay, J. Sol-gel Sci. Technol. 28, 105 (2003).
18. F. Li, J. Song, H. Yang, S. Gan, Q. Zhang, D. Han, A. Ivaska and L. Niu, Nanotechnol. 20, 455602 (2009).
19. R. Kötz and M. Carlen, Electrochim. Acta 45, 2483 (2000).
20. Q. T. Qu, Y. Shi, S. Tian, Y. H. Chen, Y. P. Wu and R. Holze, J. Power Sources 194, 1222 (2009).
21. Q. T. Qu, Y. Shi, L. L. Li, W. L. Guo, Y. P. Wu, H. P. Zhang, S. Y. Guan and R. Holze, Electrochem. Commun. 11, 1325 (2009).