High-mobility air-stable solution-shear-processed n-channel organic transistors based on core-chlorinated naphthalene diimides

Advanced Functional Materials

Volumn 21, Issue 21, 2011, Pages 4173-4181

  Lee, Wen Ya ^a,b   Oh, Joon Hak ^a,c   Suraru, Sabin Lucian ^d   Chen, Wen Chang ^b   Würthner, Frank ^d   Bao, Zhenan ^a  

^a Stanford University   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c Ulsan National Institute of Science and Technology   (South Korea)

^d UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE MATERIAL; AIR STABILITY; AIR-STABLE; AMBIENT OXYGEN; CRYSTALLINE THIN FILMS; DENSER PACKINGS; FLUOROALKYL CHAINS; GRAIN MORPHOLOGIES; HIGH MOBILITY; INVASION PATHWAYS; LOWEST UNOCCUPIED MOLECULAR ORBITAL; MOBILITY ANISOTROPY; N-CHANNEL; NAPHTHALENE DIIMIDES; ORGANIC ELECTRONICS; ORGANIC THIN FILM TRANSISTORS; ORGANIC TRANSISTOR; SHEARING DIRECTION; SIDE-CHAINS; SOLUTION SHEARING; SOLUTION-PROCESSED;

ANISOTROPY; CHLORINATION; DEPOSITION; ELECTRON MOBILITY; GRAIN BOUNDARIES; MOLECULAR ORBITALS; MOLECULAR ORIENTATION; NAPHTHALENE; SHEARING; THIN FILMS; VAPOR DEPOSITION;

THIN FILM TRANSISTORS;

EID: 82955188753     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201101606     Document Type: Article

References (42)

1. J. Zaumseil, H. Sirringhaus, Chem. Rev. 2007, 107, 1296.
2. Z. Bao, J. Locklin, Eds., Organic field-effect transistors, CRC press, Boca Raton, FL 2007.
3. M. Gross, D. C. Muller, H. G. Nothofer, U. Scherf, D. Neher, C. Brauchle, K. Meerholz, Nature 2000, 405, 661.
4. R. Kroon, M. Lenes, J. C. Hummelen, P. W. M. Blom, B. De Boer, Polym. Rev. 2008, 48, 531.
5. B. A. Jones, A. Facchetti, M. R. Wasielewski, T. J. Marks, J. Am. Chem. Soc. 2007, 129, 15259.
6. J. H. Oh, S. Liu, Z. Bao, R. Schmidt, F. Würthner, Appl. Phys. Lett. 2007, 91, 212107.
7. X. G. Guo, R. P. Ortiz, Y. Zheng, Y. Hu, Y. Y. Noh, K. J. Baeg, A. Facchetti, T. J. Marks, J. Am. Chem. Soc. 2011, 133, 1405.
8. X. W. Zhan, A. Facchetti, S. Barlow, T. J. Marks, M. A. Ratner, M. R. Wasielewski, S. R. Marder, Adv. Mater. 2011, 23, 268.
9. F. Würthner, M. Stolte, Chem. Commun. 2011, 47, 5109.
10. X. Zhan, Z. A. Tan, B. Domercq, Z. An, X. Zhang, S. Barlow, Y. Li, D. Zhu, B. Kippelen, S. R. Marder, J. Am. Chem. Soc. 2007, 129, 7246.
11. Z. Bao, A. J. Lovinger, J. Brown, J. Am. Chem. Soc. 1998, 120, 207.
12. M. M. Ling, P. Erk, M. Gomez, M. Koenemann, J. Locklin, Z. N. Bao, Adv. Mater. 2007, 19, 1123.
13. H. E. Katz, A. J. Lovinger, J. Johnson, C. Kloc, T. Siegrist, W. Li, Y. Y. Lin, A. Dodabalapur, Nature 2000, 404, 478.
14. A. Facchetti, M. Mushrush, H. E. Katz, T. J. Marks, Adv. Mater. 2003, 15, 33.
15. H. Yan, Z. Chen, Y. Zheng, C. Newman, J. R. Quinn, F. Dotz, M. Kastler, A. Facchetti, Nature 2009, 457, 679.
16. R. P. Ortiz, H. Herrera, R. Blanco, H. Huang, A. Facchetti, T. J. Marks, Y. Zheng, J. L. Segura, J. Am. Chem. Soc. 2010, 132, 8440.
17. Y. Zhao, C.-A. Di, X. Gao, Y. Hu, Y. Guo, L. Zhang, Y. Liu, J. Wang, W. Hu, D. Zhu, Adv. Mater. 2011, 23, 2448.
18. X. K. Gao, C. A. Di, Y. B. Hu, X. D. Yang, H. Y. Fan, F. Zhang, Y. Q. Liu, H. X. Li, D. B. Zhu, J. Am. Chem. Soc. 2010, 132, 3697.
19. Y. L. Lee, H. L. Hsu, S. Y. Chen, T. R. Yew, J. Phys. Chem. C 2008, 112, 1694.
20. B. J. Jung, J. Sun, T. Lee, A. Sarjeant, H. E. Katz, Chem. Mater. 2009, 21, 94.
21. B. A. Jones, A. Facchetti, T. J. Marks, M. R. Wasielewski, Chem. Mater. 2007, 19, 2703.
22. B. A. Jones, A. Facchetti, M. R. Wasielewski, T. J. Marks, Adv. Funct. Mater. 2008, 18, 1329.
23. D. Shukla, S. F. Nelson, D. C. Freeman, M. Rajeswaran, W. G. Ahearn, D. M. Meyer, J. T. Carey, Chem. Mater. 2008, 20, 7486.
24. M. L. Tang, J. H. Oh, A. D. Reichardt, Z. Bao, J. Am. Chem. Soc. 2009, 131, 3733.
25. M. Gsänger, J. H. Oh, M. Könemann, H. W. Höffken, A.-M. Krause, Z. Bao, F. Würthner, Angew. Chem. Int. Ed. 2010, 49, 740.
26. R. Schmidt, M. M. Ling, J. H. Oh, M. Winkler, M. Konemann, Z. N. Bao, F. Würthner, Adv. Mater. 2007, 19, 3692.
27. J. H. Oh, Y.-S. Sun, R. Schmidt, M. F. Toney, D. Nordlund, M. Könemann, F. Würthner, Z. Bao, Chem. Mater. 2009, 21, 5508.
28. H. Yan, Z. Chen, Y. Zheng, C. Newman, J. R. Quinn, F. Dötz, M. Kastler, A. Facchetti, Nature 2009, 457, 679.
29. Z. Chen, Y. Zheng, H. Yan, A. Facchetti, J. Am. Chem. Soc. 2009, 131, 8.
30. H. A. Becerril, M. E. Roberts, Z. H. Liu, J. Locklin, Z. N. Bao, Adv. Mater. 2008, 20, 2588.
31. A. Tracz, J. K. Jeszka, M. D. Watson, W. Pisula, K. Mullen, T. Pakula, J. Am. Chem. Soc. 2003, 125, 1682.
32. W. Pisula, A. Menon, M. Stepputat, I. Lieberwirth, U. Kolb, A. Tracz, H. Sirringhaus, T. Pakula, K. Mullen, Adv. Mater. 2005, 17, 684.
33. Z. H. Liu, H. A. Becerril, M. E. Roberts, Y. Nishi, Z. Bao, IEEE T. Electron Dev. 2009, 56, 176.
34. J. H. Oh, W.-Y. Lee, T. Noe, W.-C. Chen, M. Könemann, Z. Bao, J. Am. Chem. Soc. 2011, 133, 4204.
35. B. Yoo, B. A. Jones, D. Basu, D. Fine, T. Jung, S. Mohapatra, A. Facchetti, K. Dimmler, M. R. Wasielewski, T. J. Marks, A. Dodabalapur, Adv. Mater. 2007, 19, 4028.
36. A. C. Arias, J. D. MacKenzie, I. McCulloch, J. Rivnay, A. Salleo, Chem. Rev. 2010, 110, 3.
37. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu, E. P. Woo, Science 2000, 290, 2123.
38. J. H. Oh, S.-L. Suraru, W.-Y. Lee, M. Könemann, H. W. Höffken, C. Röger, R. Schmidt, Y. Chung, W.-C. Chen, F. Würthner, Z. Bao, Adv. Funct. Mater. 2010, 20, 2148.
39. A. Facchetti, M. Mushrush, M. H. Yoon, G. R. Hutchison, M. A. Ratner, T. J. Marks, J. Am. Chem. Soc. 2004, 126, 13859.
40. L. H. Jimison, M. F. Toney, I. McCulloch, M. Heeney, A. Salleo, Adv. Mater. 2009, 21, 1.
41. D. W. Li, E. J. Borkent, R. Nortrup, H. Moon, H. Katz, Z. N. Bao, Appl. Phys. Lett. 2005, 86, 042105.
42. B. A. Jones, M. J. Ahrens, M. H. Yoon, A. Facchetti, T. J. Marks, M. R. Wasielewski, Angew. Chem. Int. Ed. 2004, 43, 6363.