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Volumn 520, Issue 4, 2011, Pages 1223-1227
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Electrical and optical properties of Zn-In-Sn-O transparent conducting thin films
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Author keywords
Co sputtering; ITO; Transparent conductive oxides; Zinc oxide
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Indexed keywords
AMORPHOUS MATRICES;
COSPUTTERING;
ELECTRICAL AND OPTICAL PROPERTIES;
FILM COMPOSITION;
HIGH DEPOSITION TEMPERATURE;
HIGH TRANSPARENCY;
INDIUM CONTENT;
INDIUM TIN OXIDE;
ITO;
ITO FILMS;
LOW RESISTIVITY;
MORPHOLOGICAL PROPERTIES;
MULTICOMPONENT THIN FILMS;
NANOMETRIC CRYSTALS;
OXIDIZING ATMOSPHERE;
POST DEPOSITION ANNEALING;
QUATERNARY SYSTEMS;
RADIO-FREQUENCY (RF) MAGNETRON;
RF POWER;
ROOM TEMPERATURE;
THIN-FILM SILICON SOLAR CELLS;
TRANSPARENT CONDUCTIVE OXIDES;
TRANSPARENT ELECTRODE;
VISIBLE RANGE;
X-RAY DIFFRACTION STUDIES;
ZINC CONTENT;
ZNO;
AMORPHOUS FILMS;
COBALT;
CRYSTAL MICROSTRUCTURE;
DEPOSITION;
ELECTRIC PROPERTIES;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
INDIUM;
INDIUM COMPOUNDS;
MAGNETRONS;
OPTICAL PROPERTIES;
OXIDE FILMS;
SEMICONDUCTING SILICON COMPOUNDS;
THIN FILM TRANSISTORS;
THIN FILMS;
TIN;
TIN OXIDES;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC;
ZINC OXIDE;
CONDUCTIVE FILMS;
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EID: 82755197962
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.06.078 Document Type: Conference Paper |
Times cited : (26)
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References (35)
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