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Volumn 206, Issue 7, 2011, Pages 1653-1659

Large area electron beam physical vapor deposition (EB-PVD) and plasma activated electron beam (EB) evaporation - Status and prospects

Author keywords

Back side metallization; EB Mag process; Multi purpose coaters; Plasma activated EB evaporation; Spotless arc; Vario cathode

Indexed keywords

COST-SAVING; EB-MAG PROCESS; ELECTRON BEAM EVAPORATION; ELECTRON BEAM-PHYSICAL VAPOR DEPOSITION; HIGH RATE; HIGH-POWER; IN-LINE; INDUSTRIAL PRODUCTION; KEY COMPONENT; LONG TERM PROCESS; MULTI-PURPOSE; PLASMA GENERATION; PROCESS COMBINATION; ROLL TO ROLL; SPOTLESS ARC; STATUS AND PROSPECT; THIN METAL FOIL; TITANIUM-BASED; VARIO-CATHODE;

EID: 82755197117     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.09.022     Document Type: Article
Times cited : (14)

References (19)
  • 17
    • 33644985405 scopus 로고    scopus 로고
    • Untersuchungen zum diffusen katodischen Vakuumbogen bei der plasmaaktivierten Hochratebedampfung,
    • Doctoral Thesis, Magdeburg,
    • B. Scheffel, Untersuchungen zum diffusen katodischen Vakuumbogen bei der plasmaaktivierten Hochratebedampfung, Doctoral Thesis, Magdeburg, 2000.
    • (2000)
    • Scheffel, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.