Competition between polar and nonpolar growth of MgO thin films on Au(111)

Journal of Physical Chemistry C

Volumn 115, Issue 46, 2011, Pages 23043-23049

  Benedetti, S ^a,b   Nilius, N ^c   Torelli, P ^b   Renaud, G ^d   Freund, H J ^c   Valeri, S ^a,b  

^a UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^b CNR   (Italy)

^c FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^d CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AU(1 1 1 ); DEPOSITION TEMPERATURES; FILM MORPHOLOGY; GROWTH REGIME; HEXAGONAL LATTICE; HIGH OXYGEN PRESSURE; MGO THIN FILMS; NON-POLAR; OXIDE FORMATION; OXIDE GROWTH; PREPARATION CONDITIONS; ROCK SALT; SQUARE-LATTICE; SURFACE-ROUGHENING; VACUUM CONDITION;

ADSORPTION; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD;

EID: 81755177596     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp207901a     Document Type: Article

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