Erratum: Artificially nanostructured n-type SiGe bulk thermoelectrics through plasma enhanced growth of alloy nanoparticles from the gas phase (Journal of Materials Research (2011) 26: 15 (1872) DOI: 10.1557/jmr.2011.117);Artificially nanostructured n-type SiGe bulk thermoelectrics through plasma enhanced growth of alloy nanoparticles from the gas phase

Journal of Materials Research

Volumn 26, Issue 15, 2011, Pages 1872-1878

  Stein, N ^a   Petermann, N ^a   Theissmann, R ^a   Schierning, G ^a   Schmechel, R ^a   Wiggers, H ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Nanostructure; Sintering; Thermoelectric

Indexed keywords

GRAIN BOUNDARIES; MATERIALS HANDLING EQUIPMENT; NANOPARTICLES; NANOSTRUCTURES; PLASMA APPLICATIONS; POINT DEFECTS; SINTERING; SPARK PLASMA SINTERING; SYNTHESIS (CHEMICAL); THERMAL CONDUCTIVITY OF SOLIDS; THERMOELECTRICITY;

ALLOY NANOPARTICLE; FIELD ASSISTED SINTERING TECHNIQUES; HOMOGENEOUS MIXTURES; LATTICE CONTRIBUTION; MICROWAVE PLASMA REACTORS; NANOSTRUCTURED BULK; THERMO-ELECTRIC MATERIALS; THERMOELECTRIC;

SI-GE ALLOYS;

EID: 81455141738     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.311     Document Type: Erratum

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