Electrochemical deposition of silver from 1-ethyl-3-methylimidazolium trifluoromethanesulfonate

Electrochimica Acta

Volumn 56, Issue 28, 2011, Pages 10332-10339

  Ispas, Adriana ^a   Pölleth, Manuel ^b   Ba, Khanh Hoa Tran ^b   Bund, Andreas ^a   Janek, Jürgen ^b  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b JUSTUS LIEBIG UNIVERSITY   (Germany)

Author keywords

EMIm TfO ; Ag electrodeposition; EQCM; Physicochemical properties

Indexed keywords

1-ETHYL-3-METHYLIMIDAZOLIUM TRIFLUOROMETHANESULFONATE; [EMIM][TFO]; DECORATIVE PLATING; DEPOSITED LAYER; ELECTRICAL CONTACTS; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; ELECTROCHEMICAL WINDOW; EQCM; EXPERIMENTAL CONDITIONS; PHYSICOCHEMICAL PROPERTY; POTENTIODYNAMICS; POTENTIOSTATIC DEPOSITION; SILVER IONS; SURFACE FINISHING;

CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; IONIC LIQUIDS; METAL IONS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REDUCTION;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 81355147787     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.04.060     Document Type: Conference Paper

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