Improvements of electrocatalytic activity of PtRu nanoparticles on multi-walled carbon nanotubes by a H2 plasma treatment in methanol and formic acid oxidation

Electrochimica Acta

Volumn 56, Issue 24, 2011, Pages 8662-8673

  Jiang, Zhongqing ^a   Jiang, Zhong Jie ^b  

^a NINGBO UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Direct formic acid fuel cells; Direct methanol fuel cells; Electrocatalysts; Multi walled carbon nanotubes; Plasma treatment; PtRu nanoparticles

Indexed keywords

ATOMIC RATIO; CRYSTALLINE STRUCTURE; DIRECT FORMIC ACID FUEL CELLS; DIRECT METHANOL; ELECTROCATALYTIC ACTIVITY; ELECTROCHEMICALLY ACTIVE SURFACE AREAS; FORMIC ACID OXIDATION; FUNCTIONALIZED MULTI-WALLED CARBON NANOTUBES; LONG TERM STABILITY; PLASMA TREATMENT; PT-RU NANOPARTICLES; ROOM TEMPERATURE;

CARBON; CATALYST ACTIVITY; DIRECT METHANOL FUEL CELLS (DMFC); ELECTROCATALYSTS; ELECTROOXIDATION; FORMIC ACID; FORMIC ACID FUEL CELLS (FAFC); METHANOL; METHANOL FUELS; MULTIWALLED CARBON NANOTUBES (MWCN); NANOPARTICLES; PLASMA APPLICATIONS; PLASMA STABILITY; PLASMAS; PLATINUM;

PLATINUM ALLOYS;

EID: 81155162507     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.07.067     Document Type: Article

References (60)

1. B. Wu, D. Hu, Y. Kuang, B. Liu, X. Zhang, and J. Chen Angew. Chem. Int. Ed. 48 2009 4751
2. X. Ji, K.T. Lee, R. Holden, L. Zhang, J. Zhang, G.A. Botton, M. Couillard, and L.F. Nazar Nat. Chem. 2 2010 286
3. S. Zhang, Y. Shao, H. Liao, J. Liu, I.A. Aksay, G. Yin, and Y. Lin Chem. Mater. 23 2011 1079
4. G. An, P. Yu, L. Mao, Z. Sun, Z. Liu, S. Miao, Z. Miao, and K. Ding Carbon 45 2007 536
5. L. Cao, F. Scheiba, C. Roth, F. Schweiger, C. Cremers, U. Stimming, H. Fuess, L. Chen, W. Zhu, and X. Qiu Angew. Chem. Int. Ed. 45 2006 5315
6. E. Casado-Rivera J. Am. Chem. Soc. 126 2004 4043
7. Y. Kang, and C.B. Murray J. Am. Chem. Soc. 132 2010 7568
8. D. Xu, S. Bliznakov, Z. Liu, J. Fang, and N. Dimitrov Angew. Chem. Int. Ed. 49 2010 1282
9. H. Wang, Z. Jusys, and R.J. Behm J. Phys. Chem. B 108 2004 19413
10. D. Villers, S.H. Sun, A.M. Serventi, J.P. Dodelet, and S. Desilets J. Phys. Chem. B 110 2006 25916
11. C.K. Rhee, B.J. Kim, C. Ham, Y.J. Kim, K. Song, and K. Kwon Langmuir 25 2009 7140
12. X.Y. Zhang, W. Lu, J.Y. Da, H.T. Wang, D.Y. Zhao, and P.A. Webley Chem. Commun. 2009 195
13. W. Li, X. Wang, Z. Chen, M. Waje, and Y. Yan J. Phys. Chem. B 110 2006 15353
14. D.L. Boxall, G.A. Deluga, E.A. Kenik, W.D. King, and C.M. Lukehart Chem. Mater. 13 2001 891
15. H.A. Gasteiger, N. Marković, P.N. Ross Jr., and E.J. Cairns Electrochim. Acta 39 1994 1825
16. V. Georgakilas, D. Gournis, V. Tzitzios, L. Pasquato, D.M. Guldi, and M. Prato J. Mater. Chem. 17 2007 2679
17. C. Hsieh, J. Lin, and S. Yang Physica E 41 2009 373
18. L. Li, and Y. Xing J. Phys. Chem. C 111 2007 2803
19. Y. Lin, and X. Cui Langmuir 21 2005 11474
20. W. Chen, J.Y. Lee, and Z. Liu Mater. Lett. 58 2004 3166
21. S. Wang, X. Wang, and S.P. Jiang Langmuir 24 2008 10505
22. Y. Ra, J. Lee, I. Kim, S. Bong, and H. Kim J. Power Sources 187 2009 363
23. Y. Gu, and W. Wong Langmuir 22 2006 11447
24. C. Xu, L. Wang, X. Mu, and Y. Ding Langmuir 26 2010 7437
25. E.S. Steigerwalt, G.A. Deluga, D.E. Cliffel, and C.M. Lukehart J. Phys. Chem. B 105 2001 8097
26. J. Prabhuram, T.S. Zhao, Z.K. Tang, R. Chen, and Z.X. Liang J. Phys. Chem. B 110 2006 5245
27. Y. Liang, H. Zhang, B. Yi, Z. Zhang, and Z. Tan Carbon 43 2005 3144
28. W.Z. Li, X. Wang, Z.W. Chen, M. Waje, and Y.S. Yan J. Phys. Chem. B 110 2006 15353
29. B.H. Wu, D. Hu, Y.J. Kuang, B. Liu, X.H. Zhang, and J.H. Chen Angew. Chem. Int. Ed. 48 2009 4751
30. S.Y. Wang, S.P. Jiang, T.J. White, J. Guo, and X. Wang J. Phys. Chem. C 113 2009 18935
31. Y. Zhao, L.Z. Fan, H.Z. Zhong, Y.F. Li, and S.H. Yang Adv. Funct. Mater. 17 2007 1537
32. K. Balasubramanian, and M. Burghard Small 1 2005 180
33. Z.Q. Jiang, X.Y. Yu, Z.-J. Jiang, Y.D. Meng, and Y.C. Shi J. Mater. Chem. 19 2009 6720
34. Z.Q. Jiang, Z.-J. Jiang, and Y.D. Meng Appl. Surf. Sci. 257 2011 2923
35. Z.Q. Tian, S.P. Jiang, Y.M. Liang, and P.K. Shen J. Phys. Chem. B 110 2006 5343
36. R.V. Hull, L. Li, Y. Xing, and C.C. Chusuei Chem. Mater. 18 2006 1780
37. J. Liu, Z. Jiang, Z. Jiang, and Y. Meng J. Mater. Chem. 21 2011 5565
38. W. Chen, J. Kim, S. Sun, and S. Chen Phys. Chem. Chem. Phys. 8 2006 2779
39. G. Girishkumar, T.D. Hall, K. Vinodgopal, and P.V. Kamat J. Phys. Chem. B 110 2006 107
40. R.E. Melnick, and G.T.R. Palmore J. Phys. Chem. B 105 2001 9449
41. J. Prabhuram, T.S. Zhao, Z.X. Liang, and R. Chen Electrochim. Acta 52 2007 2649
42. E. Ito, M. Yamashita, S. Hagiwara, and Y. Saito Chem. Lett. 1991 351
43. M. Lin, C. Huang, M. Lo, and C. Mou J. Phys. Chem. C 112 2008 867
44. D. Yang, S. Sun, J. Dodelet, and E. Sacher J. Phys. Chem. C 112 2008 11717
45. M.S. Saha, R. Li, and X. Sun J. Power Sources 177 2008 314
46. M. Okamoto, T. Fujigaya, and N. Nakashima Small 5 2009 735
47. Z.Q. Jiang, Z.J. Jiang, X.Y. Yu, and Y.D. Meng Plasma Process. Polym. 7 2010 382
48. D. Lee, S. Hwang, and I. Lee J. Power Sources 160 2006 155
49. T. Frelink, W. Visscher, and J.A.R. van Veen Langmuir 12 1996 3702
50. W.P. Zhou, A. Lewera, R. Larsen, R.I. Masel, P.S. Bagus, and A. Wieckowski J. Phys. Chem. B 110 2006 13393
51. X. Yu, and P.G. Pickup J. Power Sources 182 2008 124
52. A. Kabbabi, R. Faure, R. Durand, B. Beden, F. Hahn, J.M. Leger, and C. Lamy J. Electroanal. Chem. 444 1998 41
53. H. Chu, Y. Shen, L. Lin, X. Qin, G. Feng, Z. Lin, J. Wang, H. Liu, and Y. Li Adv. Funct. Mater. 20 2010 3747
54. M. Weber, J.T. Wang, S. Wasmus, and R.F. Savinell J. Electrochem. Soc. 143 1996 L158
55. Y.W. Rhee, S.Y. Ha, and R.I. Masel J. Power Sources 117 2003 35
56. S. Park, Y. Xie, and M.J. Weaver Langmuir 18 2002 5792
57. J.D. Lovic J. Electroanal. Chem. 581 2005 294
58. T.J. Schmidt, and R.J. Behm Langmuir 16 2000 8159
59. S.G. Sun, and J. Clavilier J. Electroanal. Chem. 240 1988 147
60. J.F. Colomer, P. Piedigrosso, I. Willems, C. Journet, P. Bernier, G. van Tendeloo, A. Fonseca, and J.B. Nagy J. Chem. Soc. Faraday Trans. 94 1998 3753