Diamond processing by focused ion beam-surface damage and recovery

Applied Physics Letters

Volumn 99, Issue 18, 2011, Pages

  Bayn, I ^a   Bolker, A ^a   Cytermann, C ^a   Meyler, B ^a   Richter, V ^a   Salzman, J ^a   Kalish, R ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; DAMAGED SURFACES; DETRIMENTAL EFFECTS; DIAMOND PROCESSING; HYDROGEN PLASMAS; NITROGEN VACANCIES; PHOTONIC APPLICATION; PHOTONIC PROPERTIES; PROCESSING EFFECTS; SINGLE CRYSTAL DIAMOND; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

COLOR CENTERS; ION BEAMS; IONS; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTAL SURFACES; SINGLE CRYSTALS;

DIAMONDS;

EID: 80855124754     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3658631     Document Type: Article

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