Optical force stamping lithography

Nano Letters

Volumn 11, Issue 11, 2011, Pages 5066-5070

  Nedev, Spas ^a   Urban, Alexander S ^a   Lutich, Andrey A ^a   Feldmann, Jochen ^a  

^a UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALL-OPTICAL; ARBITRARY PATTERNS; COLLOIDAL NANOPARTICLES; DIFFRACTION LIMITS; FAR-FIELD; MODULATED LIGHT; OPTICAL FORCE; POSITIONING ACCURACY; SINGLE NANOPARTICLE;

NANOPARTICLES; PHOTOLITHOGRAPHY; SUBSTRATES;

STAMPING;

NANOMATERIAL;

ARTICLE; CHEMISTRY; COLLOID; MATERIALS TESTING; METHODOLOGY; OPTICAL TWEEZERS; PARTICLE SIZE; PHOTOGRAPHY; SURFACE PROPERTY; ULTRASTRUCTURE;

COLLOIDS; MATERIALS TESTING; NANOSTRUCTURES; OPTICAL TWEEZERS; PARTICLE SIZE; PHOTOGRAPHY; SURFACE PROPERTIES;

EID: 80755189359     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl203214n     Document Type: Article

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