High optical quality InP-based nanopillars fabricated by a top-down approach

Nano Letters

Volumn 11, Issue 11, 2011, Pages 4805-4811

  Naureen, Shagufta ^a   Sanatinia, Reza ^a   Shahid, Naeem ^a   Anand, Srinivasan ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; COLLOIDAL SILICA PARTICLES; EPITAXIALLY GROWN; HIGH QUALITY; INP; NANOPILLARS; OPTICAL QUALITIES; PL LINE WIDTH; QUANTUM WELL STRUCTURES; ROOM TEMPERATURE; STAMPING TECHNIQUE; TOP-DOWN APPROACH; UNIFORM ARRAY;

PLASMA ETCHING; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR QUANTUM WELLS; SILICA;

FABRICATION;

INDIUM; INDIUM PHOSPHIDE; NANOMATERIAL; PHOSPHINE DERIVATIVE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; LUMINESCENCE; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; INDIUM; LUMINESCENT MEASUREMENTS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; PHOSPHINES; SURFACE PROPERTIES;

EID: 80755125658     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl202628m     Document Type: Article

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