Thermal stability of the copolymers of silicon-containing arylacetylene resin and acetylene-functional benzoxazine

Polymer Degradation and Stability

Volumn 96, Issue 12, 2011, Pages 2276-2283

  Zhang, Jian ^a,b   Huang, Jianxiang ^b   Du, Wei ^c   Huang, Farong ^b   Du, Lei ^b  

^a XI'AN UNIVERSITY OF TECHNOLOGY   (China)

^b East China University of Science and Technology   (China)

^c Shanghai Composites Science and Technique Company Limited   (China)

Author keywords

Ablation; Acetylene functional benzoxazine; Degradation; Silicon containing arylacetylene resins; Thermal property

Indexed keywords

ABLATION MECHANISMS; ARYL ACETYLENES; BENZOXAZINE; BENZOXAZINE RESIN; CROSSLINKING REACTION; DIELS-ALDER REACTION; ETHYNYL; PARA POSITION; RING TRIMERIZATION; SILICON-CONTAINING ARYLACETYLENE RESINS; THERMAL PROPERTY; XRD;

ABLATION; ACETYLENE; DEGRADATION; LIGHTING; POLYMERIZATION; RESINS; SILICON CARBIDE; SILICON OXIDES; THERMODYNAMIC STABILITY;

FUNCTIONAL POLYMERS;

EID: 80655127661     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymdegradstab.2011.04.022     Document Type: Article

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