Dual codoping for the fabrication of low resistive p-ZnO

Journal of Alloys and Compounds

Volumn 512, Issue 1, 2012, Pages 235-240

  Balakrishnan, L ^a   Gowrishankar, S ^a   Premchander, P ^b   Gopalakrishnan, N ^a  

^a NATIONAL INSTITUTE OF TECHNOLOGY   (India)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Characterization; Dual codoping; Sputtering; ZnO

Indexed keywords

ALN; BACK DIFFUSION; CO-DOPED; CO-DOPED ZNO; CO-DOPING; CODOPING METHOD; COMPLEX FORMATIONS; DOPED FILMS; DOPED ZNO; DUAL CODOPING; GAAS SUBSTRATES; HALL EFFECT MEASUREMENT; LOW TEMPERATURE PHOTOLUMINESCENCE; P-TYPE CONDUCTIVITY; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; ROOM-TEMPERATURE RESISTIVITY; ZNO; ZNO FILMS;

ALUMINUM; ALUMINUM NITRIDE; ARSENIC; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; GALLIUM ALLOYS; GALLIUM ARSENIDE; HALL EFFECT; HOLE CONCENTRATION; MAGNETRON SPUTTERING; METALLIC FILMS; SEMICONDUCTING GALLIUM; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ZINC OXIDE;

EID: 80555150543     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2011.09.072     Document Type: Article

References (42)

1. S.J. Pearton, D.P. Norton, K. Ip, Y.W. Heo, and T. Steiner J. Vac. Sci. Technol. B 22 2004 932
2. D.C. Look, and B. Clain Phys. Status Solidi B 241 2004 624
3. P. Zhu, Z.K. Tang, G.K.L. Wong, M. Kawasakii, A. Ohtomo, H. Koinuma, and Y. Segawa Solid State Commun. 103 1999 459
4. J.G. Lu, Z.Z. Ye, Y.J. Zeng, L.P. Zhu, L. Wang, J. Yuan, B.H. Zhao, and Q.L. Liang J. Appl. Phys. 100 2006 073714
5. C.H. Park, S.B. Zhang, and S.H. Wei Phys. Rev. B 66 2002 073202
6. T. Yamamoto, and H.K. Yoshida Jpn. J. Appl. Phys. Part 2 38 1999 L166
7. J.G. Lu, Z.Z. Ye, F. Zhuge, Y.J. Zeng, B.H. Zhao, and L.P. Zhu Appl. Phys. Lett. 85 2004 3134
8. A.V. Singh, R.M. Mehra, A. Wakahara, and A. Yoshida J. Appl. Phys. 93 2003 396
9. M. Joseph, H. Tabata, H. Saeki, K. Ueda, and T. Kawai Physica B 302-303 2001 140
10. L.G. Wang, and A. Zunger Phys. Rev. Lett. 90 2003 256401
11. S. Limpijumnong, S.B. Zhang, S.-H. Wei, and C.H. Park Phys. Rev. Lett. 92 2004 155504
12. X.-Y. Li, H.-J. Li, Z.-J. Wang, H. Xia, Z.-Y. Xiong, J.-X. Wang, and B.-C. Yang Opt. Commun. 282 2009 247
13. Q.H. Li, D. Zhu, W. Liu, Y. Liu, and X.C. Ma Appl. Surf. Sci. 254 2008 2922
14. K.S. Huh, D.K. Hwang, K.H. Bang, M.K. Hong, D.H. Lee, J.M. Myong, M.S. Oh, and K. Choi Mater. Res. Soc. Symp. Proc. 692 2002 649
15. J. Wang, V. Sallet, F. Jomard, A.M.B. do Rego, E. Elamurugu, R. Martins, and E. Fortunato Thin Solid Films 515 2007 8780
16. J.C. Fan, and Z. Xie Mater. Sci. Eng. B 150 2008 61
17. T. Li-dan, W. Bing, and Z. Yue J. Alloys Compd. 509 2011 384
18. A. Kumar, M. Kumar, and B.P. Singh Appl. Surf. Sci. 256 2010 7200
19. J. Su, C. Zang, C. Cheng, Q. Niu, Y. Zhang, and K. Yu Appl. Surf. Sci. 257 2010 160
20. S.L. King, J.G.E. Gardeniers, and I.W. Boyd Appl. Surf. Sci. 9698 1996 811
21. M. Ding, B. Yao, D. Zhao, F. Fang, D. Shen, and Z. Zhang Thin Solid Films 518 2010 4390
22. S. Limpijumnong, M.F. Smith, and S.B. Zhang Appl. Phys. Lett. 89 2006 222113
23. K.P. Bhuvana, J. Elanchezhiyan, N. Gopalakrishnan, and T. Balasubramanian Appl. Surf. Sci. 255 2008 2026
24. N. Xu, Y. Xu, L. Li, Y. Shen, T. Zhang, J. Wu, J. Sun, and Z. Ying J. Vac. Sci. Technol. A 24 2006 517
25. J.C. Sun, J.Z. Zhao, H.W. Liang, J.M. Bian, L.Z. Hu, H.Q. Zhang, X.P. Liang, W.F. Liu, and G.T. Du Appl. Phys. Lett. 90 2007 121128
26. G. Du, Y. Cui, X. Xiaochuan, X. Li, H. Zhu, B. Zhang, Y. Zhang, and Y. Ma Appl. Phys. Lett. 90 2007 243504
27. T. Yamamoto, and H.K. Yoshida Physica B 302-303 2001 155
28. X.M. Duan, C. Stampfl, M.M.M. Bilek, and D.R. McKenzie Phys. Rev. B 79 2009 235208
29. Y.R. Ryu, T.S. Lee, J.A. Lubguban, H.W. White, Y.S. Park, and C.J. Youn Appl. Phys. Lett. 87 2005 153504
30. K. Vanheusden, W.L. Warren, C.H. Seager, D.R. Tallant, J.A. Voigt, and B.E. Gnade J. Appl. Phys. 79 1996 7983
31. D.H. Fan, Z.Y. Ning, and M.F. Jiang Appl. Surf. Sci. 245 2005 414
32. Y.J. Lin, C.L. Tsai, Y.M. Lu, and C.J. Liu J. Appl. Phys. 99 2006 093501
33. Y.R. Ryu, T.S. Lee, and H.W. White Appl. Phys. Lett. 83 2003 87
34. F.X. Xiu, Z. Yang, L.J. Mandalapu, D.T. Zhao, and J.L. Liua Appl. Phys. Lett. 87 2005 252102
35. Y. Ma, G.T. Du, S.R. Yang, Z.T. Li, B.J. Zhao, X.T. Yang, T.P. Yang, Y.T. Zhang, and D.L. Liu J. Appl. Phys. 95 2004 6268
36. D.J. Rogers, F. Hosseini Teherani, T. Monteiro, M. Soares, and A. Neves Phys. Status Solidi C 3 2006 1038
37. H. Tang, Z. Ye, and H. He Opt. Mater. 30 2008 1422
38. D.C. Look, D.C. Reynolds, C.W. Litton, R.L. Jones, D.B. Eason, and G. Cantwell Appl. Phys. Lett. 81 10 2002 1830
39. H.S. Kang, G.H. Kim, D.L. Kim, H.W. Chang, B.D. Ahn, and S.Y. Lee Appl. Phys. Lett. 89 2006 181103
40. S.S. Lin, J.G. Lu, Z.Z. Ye, H.P. He, X.Q. Gu, L.X. Chen, J.Y. Huang, and B.H. Zhao Solid State Commun. 148 2008 25
41. J.C. Fan, C.Y. Zhu, S. Fung, Y.C. Zhong, K.S. Wong, Z. Xie, G. Brauer, W. Anwand, W. Skorupa, C.K. To, B. Yang, C.D. Beling, and C.C. Ling J. Appl. Phys. 106 2009 073709
42. Y.H. Tak, K.B. Kim, H.G. Park, K.H. Lee, and J.R. Lee Thin Solid Films 411 2002 12