Study of the nucleation and growth mechanisms in the electrodeposition of micro- and nanostructured Cu2O thin films

Journal of Physical Chemistry C

Volumn 115, Issue 43, 2011, Pages 21373-21382

  Bijani, S ^a   Schrebler, R ^b   Dalchiele, E A ^c   Gabas M ^a   Martinez L ^a   Ramos Barrado, J R ^a  

^a UNIVERSITY OF MÁLAGA   (Spain)

^b PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^c INSTITUTO DE FÍSICA   (Uruguay)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED POTENTIALS; CRYSTAL SIZE; DIFFUSIONAL CONTROL; DIFFUSIONAL GROWTH; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL RESPONSE; GRAIN SIZE; LAYER-BY-LAYER GROWTH; NANOSTRUCTURED CU; NUCLEATION AND GROWTH; NUCLEATION MODELS; POTENTIOSTATICS; PROGRESSIVE NUCLEATION; TITANIUM SUBSTRATES;

CHARGE TRANSFER; CRYSTAL MICROSTRUCTURE; D REGION; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; GROWTH KINETICS; MORPHOLOGY; NUCLEATION; POWER QUALITY; REDUCTION; SURFACE MORPHOLOGY; THIN FILMS; THREE DIMENSIONAL; TITANIUM; VAPOR DEPOSITION;

COPPER;

EID: 80055059794     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp208535e     Document Type: Article

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