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Volumn 21, Issue 43, 2011, Pages 17242-17248

Control of epitaxy of graphene by crystallographic orientation of a Si substrate toward device applications

Author keywords

[No Author keywords available]

Indexed keywords

BACK-GATE; CONVENTIONAL LITHOGRAPHY; CRYSTALLOGRAPHIC ORIENTATIONS; DEVICE APPLICATION; DEVICE OPERATIONS; EPITAXIAL GRAPHENE; INTEGRATED DEVICE; KEY MATERIALS; SI SUBSTRATES; TOP-GATE; TUNABILITIES;

EID: 80054922124     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c1jm12921j     Document Type: Article
Times cited : (34)

References (70)
  • 7
    • 67649225738 scopus 로고    scopus 로고
    • A. K. Geim Science 2009 324 1530
    • (2009) Science , vol.324 , pp. 1530
    • Geim, A.K.1
  • 23
    • 67649225738 scopus 로고    scopus 로고
    • A. K. Geim Science 2009 324 1530
    • (2009) Science , vol.324 , pp. 1530
    • Geim, A.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.