Instrument-related geometrical factors affecting the intensity in XPS and ARXPS experiments

Journal of Electron Spectroscopy and Related Phenomena

Volumn 184, Issue 8-10, 2011, Pages 487-500

  Herrera Gomez, A ^a   Aguirre Tostado, F S ^b   Mani Gonzalez, P G ^a   Vazquez Lepe, M ^a   Sanchez Martinez, A ^a   Ceballos Sanchez, O ^a   Wallace, R M ^c   Conti, G ^d   Uritsky, Y ^d  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

^b CENTRO DE INVESTIGACIÓN EN MATERIALES AVANZADOS   (Mexico)

^c The University of Texas at Dallas   (United States)

^d APPLIED MATERIALS INC   (United States)

Author keywords

Quantitative ARXPS; Spectrometer analysis area; Spectrometer analysis volume; Transferability of analysis parameters; X ray beam focal spot; XPS rotation axis

Indexed keywords

ANGLE-RESOLVED XPS; ANGULAR DEPENDENCE; GEOMETRICAL FACTORS; GOLD FILM; PEAK AREA; PRACTICAL METHOD; QUANTITATIVE ARXPS; RELATIVE ORIENTATION; SAMPLE SURFACE; SIMPLE SYSTEM; SIZE AND SHAPE; TAKE-OFF ANGLE; TRANSFERABILITY OF ANALYSIS PARAMETERS; X RAY BEAM;

INSTRUMENTS; PHOTOELECTRON SPECTROSCOPY; ROTATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROMETERS; SPECTROMETRY; UNCERTAINTY ANALYSIS; X RAY ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 80054753555     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2011.08.002     Document Type: Article

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